Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPRT1 | P00492 | 2/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.46 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.46 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.46 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.45 |
| ▸ | ESR1 | P03372 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | GUSB | P08236 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.42 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.42 |
| ▸ | USP2 | O75604 | 1/20 | 0.42 |
| ▸ | PAK1 | Q13153 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11659934 | 1.00 | HPRT1 (0.48) | HPRT1ESR2PTPN22TRPM4TLR8 | |
| SCHEMBL93762 | 0.91 | ESR2 (0.50) | ESR2PTPN22TLR8ESR1CYP1A2 | |
| SCHEMBL25356031 | 0.84 | TRPM4 (0.55) | ESR2PTPN22TRPM4TLR8ESR1 | |
| SCHEMBL1411807 | 0.83 | HPRT1 (0.58) | HPRT1PTPN22TRPM4CYP1A2POLB | |
| SCHEMBL17720686 | 0.81 | PTPN22 (0.57) | ESR2PTPN22ESR1CYP1A2POLB | |
| SCHEMBL1754468 | 0.81 | ESR2 (0.47) | ESR2TRPM4TLR8ESR1CYP1A2 | |
| SCHEMBL28622794 | 0.80 | TRPM4 (0.61) | HPRT1PTPN22TRPM4CYP1A2POLB | |
| SCHEMBL13492510 | 0.80 | ESR2 (0.54) | ESR2ESR1CYP1A2CYP3A4TSHR | |
| SCHEMBL11795658 | 0.79 | ESR2 (0.46) | ESR2TLR8ESR1CYP1A2GUSB | |
| SCHEMBL11664918 | 0.79 | PPARG (0.43) | ESR2TLR8ESR1CYP1A2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115894258-B | Aromatic diamine monomer, and preparation and application thereof | 万华化学集团股份有限公司 | 2024-06-25 | — | — | CN | claimed |
| US-4473439-A | QUINONE, HYDROQUINONE, OR DIKETO OR HYDROXYHYDROANTHRACENE ACCELERATING ADDITIVE | OJI PAPER CO., LTD. (JP) | 1984-09-25 | — | — | US | claimed |
| US-4363700-A | Process for pulping lignocellulosic material with an alkaline sulfide cooking liquor containing an accelerating additive and reducing assistant | OJI PAPER CO., LTD. (JP) | 1982-12-14 | — | — | US | claimed |
| US-4097541-A | DECARBONYLATION IN HYDROGEN | KOGYO KAIHATSU KENKYUSHO (INDUSTRIAL RESEARCH INSTITUT) (JA) | 1978-06-27 | — | — | US | claimed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7119156-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-10-10 | — | — | US | disclosed |
| US-7070905-B2 | Pattern forming process | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-07-04 | — | — | US | disclosed |
| US-7063932-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-06-20 | — | — | US | disclosed |
| US-7029823-B2 | Resist composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-04-18 | — | — | US | disclosed |
| US-20050048400-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-03-03 | — | — | US | disclosed |
| US-20050037283-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20050037284-A1 | Polymer; radiation transparent pattern against short wavelengths and etching resistance; semiconductors | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-6660450-B2 | Acrylic ester polymer having pendant adamantane rings with oxygenated substitution; ultraviolet light transparency; dry etching resistance | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-4473439-A | QUINONE, HYDROQUINONE, OR DIKETO OR HYDROXYHYDROANTHRACENE ACCELERATING ADDITIVE | OJI PAPER CO., LTD. (JP) | 1984-09-25 | — | — | US | disclosed |
| US-4363700-A | Process for pulping lignocellulosic material with an alkaline sulfide cooking liquor containing an accelerating additive and reducing assistant | OJI PAPER CO., LTD. (JP) | 1982-12-14 | — | — | US | disclosed |
| US-4097541-A | DECARBONYLATION IN HYDROGEN | KOGYO KAIHATSU KENKYUSHO (INDUSTRIAL RESEARCH INSTITUT) (JA) | 1978-06-27 | — | — | US | disclosed |