SCHEMBL5402230

SCHEMBL5402230

CNCC(NC)(NC)NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL232262 0.81
SCHEMBL232263 0.72
SCHEMBL22317369 0.69
SCHEMBL2293158 0.67
SCHEMBL3776256 0.67
SCHEMBL2377975 0.65
SCHEMBL316572 0.65
SCHEMBL20836703 0.65
SCHEMBL7241052 0.65
SCHEMBL235703 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2007502342-A 2007-02-08 JP claimed
EP-1664167-A4 THE POLYELECTROLYTE COMPOSITION FOR HUMIDITY SENSER, POLYELECTROLYTE INK AND PREPARATION METHOD OF POLYELECTROLYTE MEMBRANE FOR SENSOR BY INKJET PRINTING HAEUN CHEMTEC CO LTD (KR) 2006-09-20 EP claimed
EP-1664167-A1 THE POLYELECTROLYTE COMPOSITION FOR HUMIDITY SENSER, POLYELECTROLYTE INK AND PREPARATION METHOD OF POLYELECTROLYTE MEMBRANE FOR SENSOR BY INKJET PRINTING Haeun Chemtec Co. Ltd. (KR) 2006-06-07 EP claimed
WO-2005014700-A1 THE POLYELECTROLYTE COMPOSITION FOR HUMIDITY SENSER, POLYELECTROLYTE INK AND PREPARATION METHOD OF POLYELECTROLYTE MEMBRANE FOR SENSOR BY INKJET PRINTING HAEUN CHEMTEC CO., LTD. (KR) 2005-02-17 WO claimed
EP-0365126-B1 Tetrakis-amido high flux membranes BEND RES INC (US) 1993-11-03 EP disclosed
EP-0365126-A1 Tetrakis-amido high flux membranes BEND RESEARCH, INC. (US) 1990-04-25 EP disclosed
US-4876009-A POLYAMIDE WITH TETRAKIS/AMINOMETHYL/METHANE; HIGH FLUX, CHLORINE RESISTANCE BEND RESEARCH, INC. (US) 1989-10-24 US disclosed