SCHEMBL540550

SCHEMBL540550

[CH2]C(Cl)C(F)(F)[CH]F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL588711 0.68
SCHEMBL14784948 0.65
SCHEMBL1023511 0.62
SCHEMBL1470395 0.62
SCHEMBL15404121 0.58
SCHEMBL15402804 0.58
SCHEMBL15403661 0.58
SCHEMBL15403704 0.56
SCHEMBL1221738 0.56
SCHEMBL15404007 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 880 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122011331-A Preparation method of high-hydrophobicity corrosion-resistant fluorine-containing polyurea material 沈阳化工大学 2026-05-12 CN claimed
US-20260049264-A1 CHEMICAL SOLUTION AND CHEMICAL SOLUTION-HOUSING ARTICLE FUJIFILM CORP (JP) 2026-02-19 US claimed
EP-4693447-A1 NEGATIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Panasonic Intellectual Property Management Co., Ltd. (JP) 2026-02-11 EP claimed
US-20250333663-A1 TREATMENT LIQUID AND TREATMENT LIQUID-HOUSING ARTICLE FUJIFILM CORP (JP) 2025-10-30 US claimed
US-20250326999-A1 CHEMICAL SOLUTION, CHEMICAL SOLUTION-HOUSING ARTICLE, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2025-10-23 US claimed
US-20250321488-A1 CHEMICAL SOLUTION AND CHEMICAL SOLUTION-HOUSING ARTICLE FUJIFILM CORP (JP) 2025-10-16 US claimed
US-20250321487-A1 TREATMENT LIQUID AND TREATMENT LIQUID-HOUSING ARTICLE FUJIFILM CORP (JP) 2025-10-16 US claimed
EP-4597620-A1 NEGATIVE-ELECTRODE MATERIAL FOR SECONDARY BATTERY, AND SECONDARY BATTERY Panasonic Intellectual Property Management Co., Ltd. (JP) 2025-08-06 EP claimed
US-20250219061-A1 NEGATIVE-ELECTRODE MATERIAL FOR SECONDARY BATTERY, AND SECONDARY BATTERY PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2025-07-03 US claimed
CN-119856295-A Negative electrode material for secondary battery and secondary battery 松下知识产权经营株式会社 2025-04-18 CN claimed
US-5599489-A ROUGHENING THE SURFACE OF MOLDS WITH SHOT BLASTING, AND TREATING ROUGHENED SURFACE WITH FLUORINE GAS ONODA CEMENT CO., LTD. (JP) 1997-02-04 US claimed
US-5530077-A Multi-phase polymerization process THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 1996-06-25 US claimed
EP-0294127-B1 Resin-laminated rubber stopper DAIKYO GOMU SEIKO KK (JP) 1994-11-09 EP claimed
US-4816334-A MULTILAYER-METAL THIN MAGNETIC FILM PROTECTIVE, OVERCOATING ON RIGIDITY SUBSTRATE TDK CORPORATION (JP) 1989-03-28 US claimed
EP-0147594-B1 MELT-MOLDABLE FLUORINE-CONTAINING RESIN COMPOSITION Otsuka Kagaku Kabushiki Kaisha (JP) 1989-02-15 EP claimed
EP-0294127-A2 Resin-laminated rubber stopper DAIKYO GOMU SEIKO LTD. (JP) 1988-12-07 EP claimed
EP-0185242-A2 Copolymers of chlorotrifluoroethylene, ethylene and perfluoroalkylethylenes AUSIMONT, U.S.A. (US) 1986-06-25 EP claimed
EP-0006493-B1 A MELT-PROCESSABLE FLUORINE-CONTAINING RESIN COMPOSITION Daikin Kogyo Co., Ltd. (JP) 1984-03-21 EP claimed
US-4276214-A CONTAINING AN AMINE ANTIOXIDANT, A BENZIMIDAZOLE OR BENZOTHIAZOLE SULFUR COMPOUND OR ORGANOSULFUR COMPOUND DAIKIN KOGYO CO., LTD. (JP) 1981-06-30 US claimed
US-4174259-A NARROWING ANODE-CATHODE GAP HOOKER CHEMICALS & PLASTICS CORP. (US) 1979-11-13 US claimed