⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7668305 | 0.73 | — | — | |
| SCHEMBL6465756 | 0.61 | — | — | |
| SCHEMBL6469592 | 0.61 | — | — | |
| SCHEMBL27944677 | 0.60 | — | — | |
| SCHEMBL28278145 | 0.57 | TDP1 (0.32) | — | |
| SCHEMBL7182004 | 0.57 | — | — | |
| SCHEMBL1402908 | 0.56 | — | — | |
| SCHEMBL8156314 | 0.56 | TDP1 (0.41) | — | |
| SCHEMBL7564453 | 0.55 | — | — | |
| SCHEMBL6468589 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11608316-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-03-21 | — | — | US | disclosed |
| US-11414382-B2 | Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20210002216-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2021-01-07 | — | — | US | disclosed |
| US-20200392079-A1 | Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2020-12-17 | — | — | US | disclosed |
| US-20180370908-A1 | NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2018-12-27 | — | — | US | disclosed |
| EP-2540761-B1 | CURABLE RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2016-08-31 | — | — | EP | disclosed |
| US-8853346-B2 | Curable resin composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20130018168-A1 | CURABLE RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-17 | — | — | US | disclosed |
| EP-2540761-A1 | CURABLE RESIN COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-01-02 | — | — | EP | disclosed |
| US-7300747-B2 | Photobase generator and curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-11-27 | — | — | US | disclosed |
| EP-1564255-B1 | Photobase generator and curable composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-09-26 | — | — | EP | disclosed |
| US-20050181300-A1 | Photobase generator and curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-08-18 | — | — | US | disclosed |
| EP-1564255-A1 | Photobase generator and curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-08-17 | — | — | EP | disclosed |