SCHEMBL5408157

SCHEMBL5408157

CC(C)(C)C=C(Cl)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.38
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28676372 0.72
SCHEMBL9956486 0.71 GRIK1 (0.40) GRIK1ALDH1A1TSHR
SCHEMBL8518270 0.71 GRIK1 (0.40) GRIK1ALDH1A1TSHR
SCHEMBL491479 0.69
SCHEMBL265247 0.69
SCHEMBL491482 0.69
SCHEMBL27166 0.69 GRIK1 (0.39) GRIK1ALDH1A1TSHR
SCHEMBL22811 0.69 GRIK1 (0.39) GRIK1ALDH1A1TSHR
SCHEMBL6915062 0.67
SCHEMBL6914228 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7163781-B2 Process for producing a semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 2007-01-16 US disclosed
US-20050031991-A1 Process for producing a semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 2005-02-10 US disclosed
US-20040043324-A1 Resin useful for resist, resist composition and pattern forming process using the same KABUSHIKI KAISHA TOSHIBA (JP) 2004-03-04 US disclosed