Ethylene Glycol

Ethylene Glycol

SCHEMBL5409966

COC.O=CO.OCCO

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methoxymethane SCHEMBL974930 0.84
Ethylene Glycol SCHEMBL27510557 0.84 TSHR (0.50) TSHR
Ethylene Glycol SCHEMBL514647 0.84
Ethylene Glycol SCHEMBL7094965 0.84 TSHR (0.50) TSHR
Ethylene Glycol SCHEMBL27361208 0.84 TSHR (0.50) TSHR
Ethylene Glycol SCHEMBL28828263 0.81
Ethylene Glycol SCHEMBL27535632 0.81
Ethylene Glycol SCHEMBL9616343 0.80 TSHR (0.56) TSHR
Ethylene Glycol SCHEMBL8082558 0.80 TSHR (0.56) TSHR
Ethylene Glycol SCHEMBL6570599 0.80 TSHR (0.56) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115968873-A Stable-component insecticide containing deltamethrin and preparation method thereof 佛山市正典生物技术有限公司 2023-04-18 CN claimed
CN-115968873-B Component-stable deltamethrin-containing pesticide and preparation method thereof 佛山市正典生物技术有限公司 2025-05-02 CN disclosed
CN-118393812-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-08-30 CN disclosed
CN-118244581-B Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-08-13 CN disclosed
CN-118393812-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
CN-118244581-A Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-06-25 CN disclosed
CN-116773641-A Method for directly sampling and measuring alcohol ether and trace elements in ester high-purity solvent or hydrogen peroxide 江苏怡达化学股份有限公司 2023-09-19 CN disclosed
CN-115968873-A Stable-component insecticide containing deltamethrin and preparation method thereof 佛山市正典生物技术有限公司 2023-04-18 CN disclosed
CN-115220300-A Patterning material, patterning composition, and pattern forming method 华为技术有限公司 2022-10-21 CN disclosed
WO-2022218315-A1 PATTERNING MATERIAL, PATTERNING COMPOSITION, AND PATTERN FORMING METHOD 华为技术有限公司 2022-10-20 WO disclosed
US-7262227-B2 Process for producing synthetic resin foam, blowing agent and premix DAIKIN INDUSTRIES, LTD. (JP) 2007-08-28 US disclosed
US-20050131091-A1 Process for producing synthetic resin foam, blowing agent and premix DAIKIN INDUSTRIES, LTD. (JP) 2005-06-16 US disclosed
US-20050043422-A1 Process for producing synthetic resin foam DAIKIN INDUSTRIES, LTD. (JP) 2005-02-24 US disclosed
EP-1498439-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM, BLOWING AGENT, AND PREMIX Daikin Industries, Ltd. (JP) 2005-01-19 EP disclosed
EP-1457506-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM Daikin Industries, Ltd. (JP) 2004-09-15 EP disclosed
US-6491729-B1 Dry-cleaning solvent composition Lee, Chin Yen (TW) 2002-12-10 US disclosed
US-6491729-B1 Dry-cleaning solvent composition Lee, Chin Yen (TW) 2002-12-10 US disclosed