⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21456775 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL27417498 | 0.46 | — | — | |
| Trimethylammonium SCHEMBL27537141 | 0.46 | — | — | |
| Trimethylammonium SCHEMBL284438 | 0.45 | — | — | |
| Trimethylammonium SCHEMBL13989274 | 0.45 | — | — | |
| Trimethylammonium SCHEMBL5582 | 0.45 | — | — | |
| Trimethylammonium SCHEMBL1331060 | 0.45 | — | — | |
| Trimethylammonium SCHEMBL5310222 | 0.45 | — | — | |
| Trimethylammonium SCHEMBL23064767 | 0.41 | — | — | |
| Trimethylammonium SCHEMBL3052815 | 0.41 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7288145-B2 | Precursors for depositing silicon containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-10-30 | — | — | US | claimed |
| US-20070004931-A1 | Precursors for depositing silicon containing films | VERSUM MATERIALS US, LLC | 2007-01-04 | — | — | US | claimed |
| US-7122222-B2 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-10-17 | — | — | US | claimed |
| US-20040146644-A1 | Precursors for depositing silicon containing films and processes thereof | VERSUM MATERIALS US, LLC | 2004-07-29 | — | — | US | claimed |
| EP-1441042-A1 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-07-28 | — | — | EP | claimed |
| US-7288145-B2 | Precursors for depositing silicon containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-10-30 | — | — | US | disclosed |
| US-7288145-B2 | Precursors for depositing silicon containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-10-30 | — | — | US | disclosed |
| US-20070004931-A1 | Precursors for depositing silicon containing films | VERSUM MATERIALS US, LLC | 2007-01-04 | — | — | US | disclosed |
| US-20070004931-A1 | Precursors for depositing silicon containing films | VERSUM MATERIALS US, LLC | 2007-01-04 | — | — | US | disclosed |
| US-7122222-B2 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-10-17 | — | — | US | disclosed |
| US-20040146644-A1 | Precursors for depositing silicon containing films and processes thereof | VERSUM MATERIALS US, LLC | 2004-07-29 | — | — | US | disclosed |
| EP-1441042-A1 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-07-28 | — | — | EP | disclosed |