SCHEMBL5439834

SCHEMBL5439834

COC(=O)COC(=O)CC[C@@H](C)[C@H]1CC[C@H]2[C@@H]3CC[C@@H]4C[C@H](O)CC[C@]4(C)[C@H]3CC[C@]12C

nearest known ligand 0.87

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPBAR1 Q8TDU6 5/20 0.87
▸ HIF1A Q16665 3/20 0.87
▸ VDR P11473 3/20 0.87
▸ CYP2C9 P11712 2/20 0.87
▸ EPHA2 P29317 4/20 0.72
▸ CASP7 P55210 3/20 0.72
▸ MAPK1 P28482 3/20 0.72
▸ USP2 O75604 3/20 0.72
▸ MAPT P10636 3/20 0.72
▸ TP53 P04637 2/20 0.72
▸ HSD17B10 Q99714 2/20 0.72
▸ BLM P54132 2/20 0.72
▸ TDP1 Q9NUW8 2/20 0.72
▸ CYP3A4 P08684 2/20 0.72
▸ LMNA P02545 2/20 0.72
▸ MDM4 O15151 1/20 0.72
▸ HSPD1 P10809 1/20 0.72
▸ TSHR P16473 1/20 0.72
▸ PTPN2 P17706 1/20 0.72
▸ PTPN1 P18031 1/20 0.72

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5439837 1.00 GPBAR1 (0.87) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL12704721 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL10226254 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL18575778 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL23285666 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL23776966 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL337581 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL22079995 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL21283583 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2
SCHEMBL1688648 0.93 GPBAR1 (1.00) GPBAR1HIF1AVDRCYP2C9EPHA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 — — US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 — — US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 — — US disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 — — US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 — — US disclosed
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