⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11440 | 0.75 | — | — | |
| SCHEMBL8796195 | 0.75 | — | — | |
| SCHEMBL625062 | 0.75 | — | — | |
| SCHEMBL6647445 | 0.71 | — | — | |
| SCHEMBL15460369 | 0.67 | HRH4 (0.59) | — | |
| SCHEMBL20472984 | 0.67 | — | — | |
| SCHEMBL1515473 | 0.67 | — | — | |
| SCHEMBL16322955 | 0.67 | HRH4 (0.41) | — | |
| SCHEMBL19725072 | 0.67 | — | — | |
| SCHEMBL9367944 | 0.66 | HRH4 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2092377-B1 | OPTICAL ARTICLE COMPRISING A DOUBLE-LAYER ABRASION AND SCRATCH RESISTANT COATING AND METHOD FOR PRODUCTION THEREOF | ESSILOR INT (FR) | 2012-02-08 | — | — | EP | disclosed |
| EP-2092377-A1 | OPTICAL ARTICLE COMPRISING A DOUBLE-LAYER ABRASION AND SCRATCH RESISTANT COATING AND METHOD FOR PRODUCTION THEREOF | ESSILOR INTERNATIONAL Compagnie Générale d'Optique (FR) | 2009-08-26 | — | — | EP | disclosed |
| WO-2008062142-A1 | OPTICAL ARTICLE COMPRISING A DOUBLE-LAYER ABRASION AND SCRATCH RESISTANT COATING AND METHOD FOR PRODUCTION THEREOF | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2008-05-29 | — | — | WO | disclosed |