SCHEMBL544797

SCHEMBL544797

CCC(C)(O)/C=C/C(C)(O)CC

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
ALDH1A1 P00352 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544798 1.00 TSHR (0.38) TSHRTDP1ALDH1A1ALOX15
SCHEMBL7688973 0.91 TSHR (0.32) TSHRTDP1ALOX15
SCHEMBL12778795 0.91 TSHR (0.32) TSHRTDP1ALOX15
SCHEMBL28808877 0.86
SCHEMBL13707158 0.84
SCHEMBL13366724 0.84
SCHEMBL8468971 0.82
SCHEMBL10580099 0.82
SCHEMBL14178932 0.82
SCHEMBL123229 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1145865-B1 Coating liquid, image recording method and recording using the same SEIKO EPSON CORP (JP) 2008-07-23 EP claimed
US-6723784-B2 WATER, FINE PARTICLE POLYMERS, PENETRATING AGENT; INK JET RECORDING, IMPARTS LIGHT RESISTANCE, WATER RESISTANCE, AND FIXATION, AND DOES NOT REQUIRE HARDENING OR FIXING PROCESSES THAT USE HEAT OR ULTRAVIOLET RADIATION SEIKO EPSON CORPORATION (JP) 2004-04-20 US claimed
US-20020009547-A1 Coating liquid, and image recording method and recording using same SEIKO EPSON CORPORATION 2002-01-24 US claimed
EP-1145865-A2 Coating liquid, image recording method and recording using the same Seiko Epson Corporation (JP) 2001-10-17 EP claimed
WO-2026046961-A1 ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE MERCK PATENT GMBH (DE) 2026-03-05 WO disclosed
US-11901173-B2 Substrate processing method SCREEN Holdings Co., Ltd. 2024-02-13 US disclosed
EP-4287245-A2 SUBSTRATE PROCESSING METHOD SCREEN Holdings Co., Ltd. (JP) 2023-12-06 EP disclosed
EP-3576133-B1 SUBSTRATE PROCESSING METHOD SCREEN HOLDINGS CO LTD (JP) 2023-11-22 EP disclosed
EP-4235758-A2 SUBSTRATE PROCESSING METHOD SCREEN Holdings Co., Ltd. (JP) 2023-08-30 EP disclosed
EP-3576134-B1 SUBSTRATE PROCESSING METHOD SCREEN HOLDINGS CO LTD (JP) 2023-06-28 EP disclosed
US-20220076941-A1 SUBSTRATE PROCESSING METHOD SCREEN Holdings Co., Ltd. (JP) 2022-03-10 US disclosed
US-11260431-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-03-01 US disclosed
US-20040242447-A1 Water-soluble surfactant composition NISSIN CHEMICAL INDUSTRY CO., LTD. (JP) 2004-12-02 US disclosed
EP-1437391-A1 Ink set, method using same, and recording SEIKO EPSON CORPORATION (JP) 2004-07-14 EP disclosed
US-20030008938-A1 Ink set, method of recording with the same, and print SEIKO EPSON CORPORTION (JP) 2003-01-09 US disclosed
EP-1164173-A1 INK SET, METHOD OF RECORDING WITH THE SAME, AND PRINT SEIKO EPSON CORPORATION (JP) 2001-12-19 EP disclosed
US-5637444-A COMPRISING POLYVINYL ALCOHOL CONTAINING ITACONIC ACID, MALEIC ACID, MALEIC ANHYDRIDE OR ESTER THEREOF AS COPOLYMER COMPONENT AND HAVING SPECIFIED SAPONIFICATION DEGREE, SELECTED HYDROXY COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1997-06-10 US disclosed
EP-0399377-B1 Cold rolling oil for steel sheet NIHON PARKERIZING (JP) 1993-11-10 EP disclosed
EP-0399377-A1 Cold rolling oil for steel sheet NIHON PARKERIZING CO., LTD. (JP) 1990-11-28 EP disclosed
US-3975381-A Process for preparing γ-lactone derivatives SAGAMI CHEMICAL RESEARCH CENTER (JA) 1976-08-17 US disclosed