SCHEMBL5451193

SCHEMBL5451193

C=C[Si](C)(OC)O[Si](C)(C=C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7791649 1.00
SCHEMBL7795839 1.00
SCHEMBL7791750 1.00
SCHEMBL16134324 0.92
SCHEMBL12762740 0.89
SCHEMBL12262738 0.88
SCHEMBL62073 0.87
SCHEMBL17063641 0.87
SCHEMBL682728 0.86
SCHEMBL13007305 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024236739-A1 SEMICONDUCTOR POWER MODULE AND PRODUCTION METHOD FOR SAME 三菱電機株式会社 2024-11-21 WO claimed
CN-114736443-A Crosslinkable polyethylene composition and application thereof, crosslinked polyethylene and preparation method and application thereof 国家能源投资集团有限责任公司 2022-07-12 CN claimed
CN-114262550-B Silane modified acrylic resin, synthesis method and primer for silicone rubber 深圳市康利邦科技有限公司 2022-06-28 CN claimed
CN-114262550-A Silane modified acrylic resin, synthetic method and primer for silicone rubber 深圳市康利邦科技有限公司 2022-04-01 CN claimed
EP-0698632-B1 Process for preparing organosiloxane terminated with silanol group SHINETSU CHEMICAL CO (JP) 2001-11-21 EP claimed
US-5576408-A Process for preparing low molecular weight organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-11-19 US claimed
US-20260132288-A1 ORGANOPOLYSILOXANE COMPOUND AND PRODUCTION METHOD THEREOF, AND COMPOSITION CONTAINING SAID COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-05-14 US disclosed
CN-121045944-B Organic-inorganic hybrid coating and application thereof in preparation of surface coating of building decorative material 湖南恒兴新材料科技股份有限公司 2026-02-27 CN disclosed
US-12552937-B2 Organopolysiloxane compound and production method thereof, and composition containing said compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-17 US disclosed
CN-120923692-A Glyoxal modified polyacrylamide and synthesis method thereof 济宁南天农科化工有限公司 2025-11-11 CN disclosed
US-20250115700-A1 (METH)ACRYLATED HYPERBRANCHED POLYMERS, METHOD OF MAKING, COMPOSITIONS INCLUDING THE SAME, AND ELECTRONIC DEVICE 3M INNOVATIVE PROPERTIES COMPANY 2025-04-10 US disclosed
WO-2025052187-A1 HYPERBRANCHED POLYMERS FOR CURABLE HIGH REFRACTIVE INDEX COMPOSITIONS, ARTICLES THEREOF, AND METHODS OF MAKING SUCH ARTICLES 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-03-13 WO disclosed
EP-4482889-A1 (METH)ACRYLATED HYPERBRANCHED POLYMERS, METHOD OF MAKING, COMPOSITIONS INCLUDING THE SAME, AND ELECTRONIC DEVICE 3M Innovative Properties Company (US) 2025-01-01 EP disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
EP-0698632-B1 Process for preparing organosiloxane terminated with silanol group SHINETSU CHEMICAL CO (JP) 2001-11-21 EP disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed
US-5576408-A Process for preparing low molecular weight organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-11-19 US disclosed
EP-0698632-A1 Process for preparing organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-02-28 EP disclosed