⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27458054 | 0.79 | — | — | |
| SCHEMBL6046242 | 0.74 | — | — | |
| SCHEMBL3295736 | 0.69 | — | — | |
| SCHEMBL797890 | 0.69 | — | — | |
| SCHEMBL8707720 | 0.69 | — | — | |
| SCHEMBL27884552 | 0.67 | — | — | |
| SCHEMBL3187920 | 0.67 | — | — | |
| SCHEMBL315517 | 0.67 | — | — | |
| SCHEMBL10689959 | 0.65 | — | — | |
| SCHEMBL7644379 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6107096-A | Method of fabricating a salicide-structured MOS semiconductor device having a cobalt disilicied film | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | claimed |
| US-5899720-A | SEMICONDUCTORS, VACUUM | NEC CORPORATION (JP) | 1999-05-04 | — | — | US | claimed |
| JP-8186085-A | — | — | None | — | — | JP | disclosed |
| US-8585753-B2 | Fibrillated biodegradable prosthesis | SCANLON JOHN JAMES (US) | 2013-11-19 | — | — | US | disclosed |
| US-20070207186-A1 | Tear and abrasion resistant expanded material and reinforcement | SCANLON JOHN J | 2007-09-06 | — | — | US | disclosed |
| EP-0828786-B1 | THERMALLY STABLE ANTISTATIC AGENTS | KENRICH PETROCHEMICALS (US) | 2002-10-23 | — | — | EP | disclosed |
| US-6107096-A | Method of fabricating a salicide-structured MOS semiconductor device having a cobalt disilicied film | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | disclosed |
| US-6106762-A | Processes for forming polymeric seamless belts and imaging members | XEROX CORPORATION (US) | 2000-08-22 | — | — | US | disclosed |
| EP-0828786-A4 | THERMALLY STABLE ANTISTATIC AGENTS | KENRICH PETROCHEMICALS (US) | 2000-01-12 | — | — | EP | disclosed |
| US-5899720-A | SEMICONDUCTORS, VACUUM | NEC CORPORATION (JP) | 1999-05-04 | — | — | US | disclosed |
| EP-0828786-A1 | THERMALLY STABLE ANTISTATIC AGENTS | KENRICH PETROCHEMICALS, INC. (US) | 1998-03-18 | — | — | EP | disclosed |
| US-5659058-A | ORGANOZIRCONIUM COMPOUND | KENRICH PETROCHEMICALS, INC. (US) | 1997-08-19 | — | — | US | disclosed |
| WO-1996038500-A1 | THERMALLY STABLE ANTISTATIC AGENTS | KENRICH PETROCHEMICALS, INC. (US) | 1996-12-05 | — | — | WO | disclosed |
| EP-0501738-B1 | Process for forming polymeric seamless belts and imaging members | XEROX CORP (US) | 1996-09-04 | — | — | EP | disclosed |
| JP-H08186085-A | MANUFACTURE OF SEMICONDUCTOR DEVICE | NEC CORP | 1996-07-16 | — | — | JP | disclosed |
| EP-0501738-A2 | Process for forming polymeric seamless belts and imaging members | XEROX CORPORATION (US) | 1992-09-02 | — | — | EP | disclosed |
| US-5128091-A | Processes for forming polymeric seamless belts and imaging members | XEROX CORPORATION (US) | 1992-07-07 | — | — | US | disclosed |