SCHEMBL5455892

SCHEMBL5455892

C=C(C)C(=O)OCCOCCOCCOCCCCCCCCCCCC

nearest known ligand 0.79

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.79
THRB P10828 2/20 0.65
CES2 O00748 2/20 0.52
HTT P42858 2/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
MAPT P10636 1/20 0.50
POLB P06746 1/20 0.44
APEX1 P27695 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
NAAA Q02083 1/20 0.44
DGKA P23743 1/20 0.44
RAD52 P43351 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
EPHX1 P07099 1/20 0.42
PLA2G2C Q5R387 1/20 0.41
ALDH1A1 P00352 1/20 0.39
HCAR2 Q8TDS4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL874759 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL19077762 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL5458580 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL11114441 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL19077763 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL5454703 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL19077765 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL874556 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL2997982 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1
SCHEMBL7641931 1.00 TSHR (0.79) TSHRTHRBCES2HTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9417522-B2 Photosensitive resin composition and method for producing resist pattern JSR CORPORATION (JP) 2016-08-16 US disclosed
US-20150185604-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN JSR CORPORATION (JP) 2015-07-02 US disclosed
US-20070231747-A1 Radiation-sensitive negative resin composition JSR CORPORATION (JP) 2007-10-04 US disclosed
US-6395393-B1 MULTILAYER; CORE WITH PHOTOCURABLE COVERINGS THE FURUKAWA ELECTRIC CO., LTD. (JP) 2002-05-28 US disclosed
US-6174604-B1 BINDER COMPRISING A RADICAL POLYMERIZABLE OLIGOMER, A RADICAL POLYMERIZABLE MONOMER, A PHOTOPOLYMERIZATION INITIATOR, AND A SILICONE COMPOUND MODIFIED WITH A GROUP CONTAINING A LONG CHAIN ETHYLENE OXIDE-PROPYLENE OXIDE; SUBMARINE CABLES THE FURUKAWA ELECTRIC CO., LTD. (JP) 2001-01-16 US disclosed