SCHEMBL5457310

SCHEMBL5457310

CC=NC(=S)N=CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL82013 0.72
SCHEMBL10394965 0.72
SCHEMBL28444550 0.72
SCHEMBL28518552 0.69
SCHEMBL230705 0.69
SCHEMBL28348093 0.69
Thiourea SCHEMBL8845816 0.69 TSHR (0.38)
SCHEMBL4165217 0.69
SCHEMBL4165215 0.69
SCHEMBL27810726 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115255358-B Surface modification method of metal powder material, modified metal powder material and application of modified metal powder material 西安隆基乐叶光伏科技有限公司 2024-01-16 CN disclosed
CN-116555770-A Three-in-one pretreatment composition and preparation method thereof 厦门斯福泽瑞科技有限公司 2023-08-08 CN disclosed
CN-115255358-A Surface modification method of metal powder material, modified metal powder material and application thereof 西安隆基乐叶光伏科技有限公司 2022-11-01 CN disclosed
CN-110382652-A Resistance adjustment agent 株式会社大阪曹达 2019-10-25 CN disclosed
CN-106459647-B Fast setting aqueous coating 巴斯夫欧洲公司 2019-10-01 CN disclosed
CN-106905711-A Styrene-butadiene-copolymer of non-carboxylation and its production and use 巴斯夫欧洲公司 2017-06-30 CN disclosed
CN-106459647-A Fast setting aqueous coating 巴斯夫欧洲公司 2017-02-22 CN disclosed
US-9564638-B2 Battery electrode or separator surface protective agent composition, battery electrode or separator protected by the composition, and battery having the battery electrode or separator KYORITSU CHEMICAL & CO., LTD. (JP) 2017-02-07 US disclosed
US-20160172678-A1 BINDER FOR NON-AQUEOUS ELECTRICITY STORAGE ELEMENT, AND NON-AQUEOUS ELECTRICITY STORAGE ELEMENT KYORITSU CHEMICAL & CO., LTD. (JP) 2016-06-16 US disclosed
CN-103261245-B Styrene-based copolymers containing acid monomer units and dispersion, preparation and purposes BASF SE (DE) 2016-04-27 CN disclosed
CN-103261245-A Styrene-based copolymers having acid monomer units, dispersions, preparation and use thereof BASF SE 2013-08-21 CN disclosed
US-7903230-B2 Method for producing liquid crystal display cell and sealing agent for liquid crystal display cell MITSUI CHEMICALS, INC. (JP) 2011-03-08 US disclosed
US-20070179221-A1 Method for producing liquid crystal display cell and sealing agent for liquid crystal display cell MITSUI CHEMICALS, INC. 2007-08-02 US disclosed
US-20050143513-A1 Method for producing liquid crystal display cell and sealing agent for liquid crystal display cell MITSUI CHEMICALS, INC. (JP) 2005-06-30 US disclosed
EP-1480071-A1 METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY CELL AND SEALING AGENT FOR LIQUID CRYSTAL DISPLAY CELL Mitsui Chemicals, Inc. (JP) 2004-11-24 EP disclosed
CN-1211210-A Process for producing dip-coated articles BASF AG (DE) 1999-03-17 CN disclosed
US-5466757-A Thiourea and sulfur donors with metal compounds for curing and vulcanization SHOWA DENKO KABUSHIKI KAISHA (JP) 1995-11-14 US disclosed
EP-0268457-B1 PROCESS FOR PRODUCTION OF CHLORINATED ETHYLENE-PROPYLENE COPOLYMERS SHOWA DENKO KABUSHIKI KAISHA (JP) 1993-01-20 EP disclosed
US-5087673-A Chlorination in aqueous suspension; controlling temperature SHOWA DENKO K.K. (JP) 1992-02-11 US disclosed
EP-0268457-A2 Process for production of chlorinated ethylene-propylene copolymers SHOWA DENKO KABUSHIKI KAISHA (JP) 1988-05-25 EP disclosed