⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18416016 | 0.87 | — | — | |
| SCHEMBL14826772 | 0.87 | — | — | |
| SCHEMBL133158 | 0.85 | — | — | |
| SCHEMBL6573256 | 0.84 | — | — | |
| SCHEMBL18719915 | 0.82 | — | — | |
| SCHEMBL20544711 | 0.81 | — | — | |
| SCHEMBL13232087 | 0.80 | — | — | |
| SCHEMBL8397041 | 0.78 | — | — | |
| SCHEMBL20451214 | 0.78 | — | — | |
| SCHEMBL5701719 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2796521-B1 | Low-Temperature, Fast Curing Coating Composition and Cured Article | SHINETSU CHEMICAL CO (JP) | 2020-02-12 | — | — | EP | disclosed |
| US-9683131-B2 | Low-temperature, fast curing coating composition and cured article | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-20140323653-A1 | LOW-TEMPERATURE, FAST CURING COATING COMPOSITION AND CURED ARTICLE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-30 | — | — | US | disclosed |
| EP-2796521-A1 | Low-Temperature, Fast Curing Coating Composition and Cured Article | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-10-29 | — | — | EP | disclosed |
| US-20070178319-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1564269-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-20040216641-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| EP-0967216-B1 | Method for manufacturing siloxane compounds | DOW CORNING TORAY SILICONE (JP) | 2004-04-21 | — | — | EP | disclosed |
| EP-0967216-A1 | Method for manufacturing siloxane compounds | Dow Corning Toray Silicone Company, Ltd. (JP) | 1999-12-29 | — | — | EP | disclosed |
| US-5939507-A | Method for manufacturing siloxane compounds | DOW CORNING TORAY SILICONE CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |