SCHEMBL546870

SCHEMBL546870

O=C(OCCCCCCCCCCCCCCCCCCBr)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.39
HDAC1 Q13547 2/20 0.33
HDAC2 Q92769 2/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
TSHR P16473 1/20 0.32
HTT P42858 1/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC4 P56524 1/20 0.31
HDAC7 Q8WUI4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2183095 1.00 TDP1 (0.39) TDP1HDAC1HDAC2MEN1KMT2A
SCHEMBL546301 1.00 TDP1 (0.39) TDP1HDAC1HDAC2MEN1KMT2A
SCHEMBL546330 1.00 TDP1 (0.39) TDP1HDAC1HDAC2MEN1KMT2A
SCHEMBL547443 1.00 TDP1 (0.39) TDP1HDAC1HDAC2MEN1KMT2A
SCHEMBL546826 1.00 TDP1 (0.39) TDP1HDAC1HDAC2MEN1KMT2A
SCHEMBL546350 0.94 TDP1 (0.35) TDP1HDAC1HDAC2KMT2A
SCHEMBL547199 0.94 TDP1 (0.35) TDP1HDAC1HDAC2KMT2A
SCHEMBL547408 0.94 TDP1 (0.35) TDP1HDAC1HDAC2KMT2A
SCHEMBL546322 0.94 TDP1 (0.35) TDP1HDAC1HDAC2KMT2A
SCHEMBL546857 0.94 TDP1 (0.35) TDP1HDAC1HDAC2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed