SCHEMBL548091

SCHEMBL548091

CCCCCCC[CH]C#N

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.46
THRB P10828 1/20 0.42
FAAH O00519 2/20 0.41
TRPV1 Q8NER1 1/20 0.41
DNM1 Q05193 4/20 0.39
EP300 Q09472 1/20 0.37
GMNN O75496 1/20 0.35
USP2 O75604 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35
CYP2C9 P11712 1/20 0.35
ALOX15 P16050 1/20 0.35
APEX1 P27695 1/20 0.35
CYP2C19 P33261 1/20 0.35
RECQL P46063 1/20 0.35
BLM P54132 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HSD17B10 Q99714 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4754565 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4754034 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4755745 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4757175 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4754613 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4754660 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL7616056 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL6050200 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL22207479 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1
SCHEMBL4754041 1.00 TSHR (0.46) TSHRTHRBFAAHTRPV1DNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11320739-B2 Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate JSR CORPORATION (JP) 2022-05-03 US claimed
EP-2855492-B1 PROCESS FOR STABILIZING HYDROCYANATION CATALYST INVISTA TECHNOLOGIES SARL (CH) 2017-07-26 EP claimed
CN-117558987-B Lithium ion battery electrolyte and lithium ion battery 江苏天鹏电源有限公司 2024-05-03 CN disclosed
CN-117558987-A Lithium ion battery electrolyte and lithium ion battery 江苏天鹏电源有限公司 2024-02-13 CN disclosed
CN-113169421-B Separator for lithium secondary battery and lithium secondary battery including the same 三星SDI株式会社 2024-02-09 CN disclosed
CN-117242116-A Triazinyl ultraviolet absorbing polymers 巴斯夫欧洲公司 2023-12-15 CN disclosed
CN-113228399-B Separator for lithium secondary battery and lithium secondary battery including the same 三星SDI株式会社 2023-11-24 CN disclosed
CN-114456295-B Preparation method of porous polyion liquid 西北师范大学 2023-11-24 CN disclosed
WO-2023219307-A1 SEPARATOR FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING SAME 삼성에스디아이 주식회사 2023-11-16 WO disclosed
WO-2023219306-A1 SEPARATOR FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY COMPRISING SAME 삼성에스디아이 주식회사 2023-11-16 WO disclosed
WO-2023219304-A1 SEPARATOR FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING SAME 삼성에스디아이 주식회사 2023-11-16 WO disclosed
EP-0409634-A2 Liquid crystal compounds and optically active compounds SANYO CHEMICAL INDUSTRIES LTD. (JP) 1991-01-23 EP disclosed
US-4962011-A Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1990-10-09 US disclosed
EP-0219154-A2 Furyl compounds, their use as fungicides and their preparation SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1987-04-22 EP disclosed
US-4594303-A Containing charge generating and charge transfer material FUJI PHOTO FILM CO., LTD. (JP) 1986-06-10 US disclosed
US-4524104-A ACRYLIC COPOLYMER AND BLOCKED ISOCYANATE SANYO CHEMICAL INDUSTRIES, LTD. (JP) 1985-06-18 US disclosed
US-4500622-A HYDRAZONE COMPOUND, (THIO-)BARBITURIC ACID DERIVATIVE AND BINDER FUJI PHOTO FILM CO., LTD. 1985-02-19 US disclosed
US-4469768-A Electrophotographic light-sensitive material comprising a charge-generating material and a charge-transporting material FUJI PHOTO FILM CO., LTD. (JP) 1984-09-04 US disclosed
US-4423130-A HEAT AND LIGHT STABILIZATION; OZONE RESISTANCE; CHARGE TRANSPORT FUJI PHOTO FILM CO., LTD. (JP) 1983-12-27 US disclosed
EP-0026127-A1 Display device with memory THOMSON-CSF (FR) 1981-04-01 EP disclosed