⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5483227 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL8468147 | 0.98 | — | — | |
| SCHEMBL709361 | 0.98 | — | — | |
| Ammonia Solution, Strong SCHEMBL3483075 | 0.97 | — | — | |
| SCHEMBL4258788 | 0.84 | TET2 (0.31) | — | |
| SCHEMBL6151374 | 0.83 | — | — | |
| SCHEMBL4626115 | 0.83 | — | — | |
| SCHEMBL8466064 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL4161928 | 0.82 | TET2 (0.31) | — | |
| Ammonia Solution, Strong SCHEMBL30373200 | 0.82 | TET2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1686425-B1 | METHOD FOR FORMING MULTILAYER RESIST | DAIKIN IND LTD (JP) | 2018-06-13 | — | — | EP | disclosed |
| US-9040223-B2 | Resist composition, patterning process and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20140178820-A1 | RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20070196763-A1 | Method of forming laminated resist | DAIKIN INDUSTRIES, LTD. | 2007-08-23 | — | — | US | disclosed |
| EP-1686425-A1 | METHOD FOR FORMING MULTILAYER RESIST | Daikin Industries, Ltd. (JP) | 2006-08-02 | — | — | EP | disclosed |