SCHEMBL5484372

SCHEMBL5484372

CCC(C)OC([SiH3])=C(OC(C)CC)OC(C)CC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8087707 0.72
SCHEMBL6534767 0.68
SCHEMBL438670 0.67
SCHEMBL6180168 0.67 TSHR (0.37) TSHR
SCHEMBL540124 0.67 TSHR (0.36) TSHR
SCHEMBL29277797 0.65
SCHEMBL25382868 0.65 MAPT (0.38) TSHR
SCHEMBL17730956 0.65 TSHR (0.35) TSHR
SCHEMBL2980293 0.65 MAPT (0.38) TSHR
SCHEMBL25380452 0.65 MAPT (0.38) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118843711-A Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film 东曹株式会社 2024-10-25 CN disclosed
CN-117355632-A Method for producing planarizing film, material for planarizing film, and planarizing film 东曹株式会社 2024-01-05 CN disclosed
WO-2022230944-A1 PLANARIZING FILM MANUFACTURING METHOD, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM 東ソー株式会社 2022-11-03 WO disclosed
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed