⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22733754 | 0.89 | — | — | |
| SCHEMBL22767340 | 0.88 | — | — | |
| SCHEMBL225843 | 0.86 | — | — | |
| SCHEMBL22733759 | 0.85 | — | — | |
| SCHEMBL18297738 | 0.80 | SOAT1 (0.30) | — | |
| Ethylene SCHEMBL21749887 | 0.80 | — | — | |
| Bicarbonate SCHEMBL26136232 | 0.80 | CA1 (0.33) | — | |
| SCHEMBL22733763 | 0.79 | — | — | |
| SCHEMBL23827516 | 0.78 | — | — | |
| SCHEMBL28196503 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200388880-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH ELECTROLYTE ADDITIVE COMPOUNDS | ENEVATE CORPORATION | 2020-12-10 | — | — | US | claimed |
| US-20070224829-A1 | Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-09-27 | — | — | US | claimed |
| US-20050014383-A1 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | VERSUM MATERIALS US, LLC | 2005-01-20 | — | — | US | claimed |
| EP-1498940-A2 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-19 | — | — | EP | claimed |
| US-11742519-B2 | Silicon-based energy storage devices with electrolyte additive compounds | ENEVATE CORPORATION (US) | 2023-08-29 | — | — | US | disclosed |
| US-11742519-B2 | Silicon-based energy storage devices with electrolyte additive compounds | ENEVATE CORPORATION (US) | 2023-08-29 | — | — | US | disclosed |
| US-11742519-B2 | Silicon-based energy storage devices with electrolyte additive compounds | ENEVATE CORPORATION (US) | 2023-08-29 | — | — | US | disclosed |
| US-20200388880-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH ELECTROLYTE ADDITIVE COMPOUNDS | ENEVATE CORPORATION | 2020-12-10 | — | — | US | disclosed |
| US-20200388880-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH ELECTROLYTE ADDITIVE COMPOUNDS | ENEVATE CORPORATION | 2020-12-10 | — | — | US | disclosed |
| US-20070224829-A1 | Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-09-27 | — | — | US | disclosed |
| US-20050014383-A1 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | VERSUM MATERIALS US, LLC | 2005-01-20 | — | — | US | disclosed |
| EP-1498940-A2 | Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-19 | — | — | EP | disclosed |