SCHEMBL549045

SCHEMBL549045

O=C([O-])C1(O)CC1.O=C([O-])C1(O)CC1.O=C([O-])C1(O)CC1.[Sb+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10727601 0.93
SCHEMBL10388323 0.93
Lithium Ion SCHEMBL9861755 0.93
Zinc Ion SCHEMBL8845852 0.93
SCHEMBL10389158 0.93
SCHEMBL675851 0.93
SCHEMBL2805395 0.93
SCHEMBL2802372 0.93
Potassium Ion SCHEMBL7907680 0.93
SCHEMBL6757052 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 253 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12466914-B2 Retardation film and applications thereof OSAKA GAS CHEMICALS CO., LTD. (JP) 2025-11-11 US disclosed
US-12384132-B2 Retardation film and method for producing same OSAKA GAS CHEMICALS CO., LTD. (JP) 2025-08-12 US disclosed
US-12366694-B2 Retardation film and method for producing the same OSAKA GAS CHEMICALS CO., LTD. (JP) 2025-07-22 US disclosed
US-20250215231-A1 ULTRAVIOLET ABSORBER OSAKA GAS CHEMICALS CO., LTD. (JP) 2025-07-03 US disclosed
WO-2025110103-A1 POLYESTER-BASED RESIN, AND PRODUCTION METHOD AND USAGE FOR SAME 大阪ガスケミカル株式会社 2025-05-30 WO disclosed
EP-4506327-A1 ULTRAVIOLET ABSORBENT Osaka Gas Chemicals Co., Ltd. (JP) 2025-02-12 EP disclosed
US-20250026900-A1 HEAT-SHRINKABLE POLYESTER FILM FAR EASTERN NEW CENTURY CORPORATION (TW) 2025-01-23 US disclosed
WO-2025005014-A1 THERMOPLASTIC RESIN, MOLDED BODY, AND OPTICAL MEMBER 富士フイルム株式会社 2025-01-02 WO disclosed
US-20250001726-A1 RETARDATION FILM AND METHOD FOR PRODUCING SAME OSAKA GAS CHEMICALS CO., LTD. (JP) 2025-01-02 US disclosed
CN-118302701-A Retardation film and method for producing same 大阪燃气化学株式会社 2024-07-05 CN disclosed
WO-2003010225-A1 OXYGEN-SCAVENGING RESIN COMPOSITIONS AND CONTAINERS HAVING LOW HAZE AND RELATED METHODS M & G POLIMERI ITALIA S.P.A. (IT) 2003-02-06 WO disclosed
US-6174655-B1 LONGITUDINAL STRETCHING; TRANSPARENCY; SLIDABILITY FUJI PHOTO FILM CO., LTD. (JP) 2001-01-16 US disclosed
US-6130262-A SUBJECTING NAPHTHALENE DICARBOXYLIC ACID OR ITS LOWER ALKYL ESTER AND ETHYLENE GLYCOL TO ESTER EXCHANGE REACTION OR ESTERIFICATION TO PRODUCE POLYETHYLENE NAPHTHALATE;RECOVERED POLYETHYLENE NAPHTHALATE RESIN IS CHARGED BEFORE EFFUSION FUJI PHOTO FILM CO., LTD. (JP) 2000-10-10 US disclosed
US-6113997-A REACTING ETHYLENE GLYCOL WITH TEREPHALIC ACID AND ISOPHTHALIC ACIDS TO FORM A MELT PHASE COPOLYMER HAVING DIETHYLENE GLYCOL CONTANT LESS THAN 5%, RECOVRING, HEATING A PORTION OF COPOLYMER TO HIGH TEMPERATURE FOR REDUCING ACETALDEHYDE SHELL OIL COMPANY (US) 2000-09-05 US disclosed
EP-0962477-A2 Method of producing polyester and charging apparatus therefor FUJI PHOTO FILM CO., LTD. (JP) 1999-12-08 EP disclosed
WO-1999061505-A2 PROCESS TO PREPARE A POLYESTER RESIN SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) 1999-12-02 WO disclosed
US-5851744-A Photographic film FUJI PHOTO FILM CO., LTD. (JP) 1998-12-22 US disclosed
WO-1998046661-A1 PROCESS FOR THE PREPARATION OF ANTIMONY ETHYLENE GLYCOLATE TANAKA ENGINEERING CO., LTD. (JP) 1998-10-22 WO disclosed
WO-1998046661-A1 PROCESS FOR THE PREPARATION OF ANTIMONY ETHYLENE GLYCOLATE TANAKA ENGINEERING CO., LTD. (JP) 1998-10-22 WO disclosed
US-3935170-A CONDENSATION POLYMERIZATION, POLYETHYLENE TEREPHTHALATE NL INDUSTRIES, INC. (US) 1976-01-27 US disclosed