SCHEMBL5495673

SCHEMBL5495673

CCCCCCCCCCCCCCCCCCCC(N)OC(C)=O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.49
GRIK2 Q13002 2/20 0.49
GPR84 Q9NQS5 3/20 0.48
FFAR1 O14842 1/20 0.48
SLC1A2 P43004 1/20 0.46
SLC1A1 P43005 1/20 0.46
LAP3 P28838 2/20 0.46
FAAH O00519 2/20 0.45
SPHK1 Q9NYA1 1/20 0.44
ZDHHC7 Q9NXF8 1/20 0.43
PRKCA P17252 2/20 0.42
MAPT P10636 1/20 0.42
TP53 P04637 1/20 0.42
LCK P06239 1/20 0.42
PPARD Q03181 1/20 0.42
ZDHHC20 Q5W0Z9 1/20 0.42
ZDHHC2 Q9UIJ5 1/20 0.42
S1PR2 O95136 1/20 0.42
S1PR4 O95977 1/20 0.42
S1PR1 P21453 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL325448 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL609942 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL5494791 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL133143 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL3676331 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL66570 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL5490300 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL10985746 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL325396 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2
SCHEMBL3431733 1.00 GRIK1 (0.49) GRIK1GRIK2GPR84FFAR1SLC1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4554555-A Recording method by use of inks RICOH COMPANY, LTD. (JP) 1985-11-19 US claimed
US-7169444-B2 Method for treating surface of ink jet recording medium having recorded image SEIKO EPSON CORPORATION (JP) 2007-01-30 US disclosed
US-20030005945-A1 Method for surface-treatment, surface-treated article and device for surface treatment SEIKO EPSON CORPORATION (JP) 2003-01-09 US disclosed
EP-1186439-A1 METHOD FOR SURFACE TREATMENT, SURFACE-TREATED ARTICLE AND DEVICE FOR SURFACE TREATMENT SEIKO EPSON CORPORATION (JP) 2002-03-13 EP disclosed
US-4554555-A Recording method by use of inks RICOH COMPANY, LTD. (JP) 1985-11-19 US disclosed