SCHEMBL5499574

SCHEMBL5499574

C=CCOCCO.[PoH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25614 0.97
Ethylene Glycol SCHEMBL27486822 0.94 TSHR (0.47)
Ethylene Glycol SCHEMBL27629265 0.94 TSHR (0.47)
SCHEMBL1684954 0.94
SCHEMBL4710145 0.94 TSHR (0.47)
SCHEMBL11558632 0.94
SCHEMBL7879363 0.92 MEN1 (0.58)
SCHEMBL7884151 0.92 MEN1 (0.58)
SCHEMBL3663413 0.92 MEN1 (0.58)
SCHEMBL426095 0.92 MEN1 (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0712436-B1 LOW-FOAMING WASHING OR CLEANING AGENTS HENKEL KGAA (DE) 1997-03-19 EP claimed
US-11414621-B2 Method of isolating lipids from a lipids containing biomass with aid of hydrophobic silica EVONIK OPERATIONS GMBH (DE) 2022-08-16 US disclosed
US-20210207056-A1 METHOD OF ISOLATING LIPIDS FROM A LIPIDS CONTAINING BIOMASS WITH AID OF HYDROPHOBIC SILICA EVONIK OPERATIONS GMBH (DE) 2021-07-08 US disclosed
EP-3794097-A1 METHOD OF ISOLATING LIPIDS FROM A LIPIDS CONTAINING BIOMASS WITH AID OF HYDROPHOBIC SILICA Evonik Operations GmbH (DE) 2021-03-24 EP disclosed
US-7163783-B2 Rinse-processing composition for processing silver halide color photographic material, processing apparatus and processing method FUJI PHOTO FILM CO., LTD. (JP) 2007-01-16 US disclosed
US-20060182708-A1 Prebiotically active plant extracts HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 2006-08-17 US disclosed
US-20040043340-A1 Rinse-processing composition for processing silver halide color photographic material, processing apparatus and processing method FUJIFILM CORPORATION (JP) 2004-03-04 US disclosed
US-5753606-A DETERGENT MIXTURE WITH NONIONIC SURFACTANTS AND ANIONIC SURFACTANTS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1998-05-19 US disclosed