Nitrous Acid

Nitrous Acid

SCHEMBL550183

O=NO.[AlH3].[GaH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Nitrous Acid SCHEMBL266405 0.94
Nitrous Acid SCHEMBL466175 0.94
Nitrous Acid SCHEMBL6236762 0.88
Nitrous Acid SCHEMBL838071 0.88
Nitrous Acid SCHEMBL14876440 0.88 CA1 (0.75)
Nitrous Acid SCHEMBL23456534 0.88
Nitrous Acid SCHEMBL2229847 0.88
Nitrous Acid SCHEMBL18834685 0.88
Nitrous Acid SCHEMBL22406194 0.88
Nitrous Acid SCHEMBL28362203 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8330169-B2 Multi-gas sensor and method of fabricating the sensor NATIONAL CHENG KUNG UNIVERSITY (TW) 2012-12-11 US claimed
US-20120007099-A1 MULTI-GAS SENSOR AND METHOD OF FABRICATING THE SENSOR NATIONAL CHENG KUNG UNIVERSITY (TW) 2012-01-12 US claimed
US-20220347328-A1 MOBILE DEVICE BASED FAR ULTRA-VIOLET C LED BACTERIA/VIRUS/PATHOGEN ELIMINATOR MICRONAN INC. 2022-11-03 US disclosed
WO-2022027028-A1 VERTICAL SCHOTTKY BARRIER DIODE VIRGINIA TECH INTELLECTUAL PROPERTIES, INC. (US) 2022-02-03 WO disclosed
WO-2020252316-A1 SMARTPHONE CASE BASED FAR ULTRA-VIOLET C LED BACTERIA/VIRUS/PATHOGEN ELIMINATOR MICRONAN INC. (US) 2020-12-17 WO disclosed
WO-2020243449-A1 MOBILE DEVICE BASED FAR ULTRA-VIOLET C LED BACTERIA/VIRUS/PATHOGEN ELIMINATOR MICRONAN INC. (US) 2020-12-03 WO disclosed
US-8330169-B2 Multi-gas sensor and method of fabricating the sensor NATIONAL CHENG KUNG UNIVERSITY (TW) 2012-12-11 US disclosed
EP-1509957-B1 HIGH POWER, HIGH LUMINOUS FLUX LIGHT EMITTING DIODE AND METHOD OF MAKING SAME LUMEI OPTOELECTRONICS CORP (US) 2012-03-21 EP disclosed
US-8109981-B2 Optical therapies and devices VALAM CORPORATION (US) 2012-02-07 US disclosed
US-20120007099-A1 MULTI-GAS SENSOR AND METHOD OF FABRICATING THE SENSOR NATIONAL CHENG KUNG UNIVERSITY (TW) 2012-01-12 US disclosed
US-7897446-B2 Method of forming a high electron mobility transistor hemt, utilizing self-aligned miniature field mitigating plate and protective dielectric layer NORTHROP GRUMMAN SYSTEMS CORPORATION (US) 2011-03-01 US disclosed
US-20050236637-A1 High power, high luminous flux light emitting diode and method of making same LUMEI OPTOELECTRONICS CORPORATION (US) 2005-10-27 US disclosed
US-20050224823-A1 High power, high luminous flux light emitting diode and method of making same DALIAN MEIMING EPITAXY TECHNOLOGY CO., LTD. (CN) 2005-10-13 US disclosed
EP-1509957-A1 HIGH POWER, HIGH LUMINOUS FLUX LIGHT EMITTING DIODE AND METHOD OF MAKING SAME Axt, Inc. (US) 2005-03-02 EP disclosed
US-6859261-B2 Lithography exposure device KLEO HALBLEITERTECHNIK GMBH & CO KG (DE) 2005-02-22 US disclosed
US-20040041160-A1 High power, high luminous flux light emitting diode and method of making same AXT, INC. 2004-03-04 US disclosed
WO-2003100874-A1 HIGH POWER, HIGH LUMINOUS FLUX LIGHT EMITTING DIODE AND METHOD OF MAKING SAME AXT, INC. (US) 2003-12-04 WO disclosed
US-20030218176-A1 HIGH POWER, HIGH LUMINOUS FLUX LIGHT EMITTING DIODE AND METHOD OF MAKING SAME DALIAN MEIMING EPITAXY TECHNOLOGY CO., LTD. (CN) 2003-11-27 US disclosed
US-6650018-B1 High power, high luminous flux light emitting diode and method of making same AXT, INC. 2003-11-18 US disclosed
US-20030160948-A1 Lithography exposure device KLEO HALBLEITERTECHNIK GMBH & CO KG (DE) 2003-08-28 US disclosed