SCHEMBL5511234

SCHEMBL5511234

CCOC(=O)C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.44
MAPT P10636 6/20 0.38
KDM4E B2RXH2 1/20 0.36
POLB P06746 1/20 0.36
KMT2A Q03164 1/20 0.36
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
MLYCD O95822 1/20 0.34
ALDH1A1 P00352 1/20 0.34
DPP4 P27487 2/20 0.33
TTR P02766 1/20 0.33
MAOB P27338 1/20 0.33
LMNA P02545 2/20 0.33
MDM2 Q00987 2/20 0.33
MDM4 O15151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5008509 1.00 HCAR2 (0.44) HCAR2MAPTKDM4EPOLBKMT2A
SCHEMBL5004970 1.00 HCAR2 (0.44) HCAR2MAPTKDM4EPOLBKMT2A
SCHEMBL28327130 0.87 HCAR2 (0.47) HCAR2MAPTNPSR1ATMTHRB
SCHEMBL2969895 0.85 HCAR2 (0.50) HCAR2MAPTCA12CA1CA2
SCHEMBL2969893 0.85 HCAR2 (0.50) HCAR2MAPTCA12CA1CA2
SCHEMBL28327136 0.85 HCAR2 (0.49) HCAR2MAPTKDM4EPOLBKMT2A
Perflexane SCHEMBL28380929 0.80 TSHR (0.46) HCAR2MAPTKDM4EPOLBKMT2A
Perflenapent SCHEMBL28653908 0.80 TSHR (0.46) HCAR2MAPTKDM4EPOLBKMT2A
Acrylic Acid Ethyl Ester SCHEMBL28664750 0.80 TSHR (0.46) HCAR2MAPTKDM4EPOLBKMT2A
Acrylic Acid Ethyl Ester SCHEMBL28654779 0.80 TSHR (0.46) HCAR2MAPTKDM4EPOLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7279273-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070072135-A1 Photothermographic material FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20060292503-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2006-12-28 US disclosed
US-20060073429-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2006-04-06 US disclosed