SCHEMBL551492

SCHEMBL551492

C=CC[Se+](CC=C)CC=C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21460 0.60
SCHEMBL1931674 0.55 TSHR (0.33) TSHRALDH1A1
SCHEMBL902747 0.55 TSHR (0.33) TSHRALDH1A1
SCHEMBL1328 0.53
SCHEMBL23732 0.53
SCHEMBL23546 0.53
SCHEMBL8852489 0.53 TSHR (0.54) TSHRALDH1A1
SCHEMBL23116592 0.50
SCHEMBL20507075 0.50
Phosphine SCHEMBL20503111 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7435516-B2 Photosensitive material for non-substrate liquid crystal display INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2008-10-14 US claimed
US-7425282-B2 Polymer liquid crystal device and fabrication method thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2008-09-16 US claimed
US-20080044597-A1 Photosensitive material for non-substrate liquid crystal display INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2008-02-21 US claimed
US-20070063171-A1 Polymer liquid crystal device and fabrication method thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 2007-03-22 US claimed
US-20060222839-A1 Photosensitive material for non-substrate liquid crystal display INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-10-05 US claimed
US-20050106496-A1 Photosensitive material for non-substrate liquid crystal display INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2005-05-19 US claimed
JP-61031426-A None JP disclosed
CN-118159584-A Curable resin composition and cured product thereof 株式会社大赛璐 2024-06-07 CN disclosed
CN-117586478-A Curable composition, cured product thereof, and wafer level lens 株式会社大赛璐 2024-02-23 CN disclosed
CN-116438066-A Laminated film and flexible device 株式会社大赛璐 2023-07-14 CN disclosed
CN-116018261-A Polyorganosilsesquioxane, curable composition, cured product, hard coating film, adhesive sheet, and laminate 株式会社大赛璐 2023-04-25 CN disclosed
WO-2020053196-A1 METHOD FOR THE BIOCATALYTIC ALKYLATION OF A SUBSTRATE UNIVERSITÄT BASEL (CH) 2020-03-19 WO disclosed
EP-2078607-B1 PROCESS FOR PRODUCING A METAL FILM COATED MATERIAL, PROCESS FOR PRODUCING A METALLIC PATTERN BEARING MATERIAL AND USE OF A COMPOSITION FOR POLYMER LAYER FORMATION FUJIFILM CORP (JP) 2018-09-12 EP disclosed
EP-0755803-A1 LITHOGRAPHIC FORM PLATE TORAY INDUSTRIES, INC. (JP) 1997-01-29 EP disclosed
US-5596023-A Sealing material for liquid crystal display panel, and liquid crystal display panel using it SHARP KABUSHIKI KAISHA (JP) 1997-01-21 US disclosed
EP-0442635-B1 Novel initiators for cationic polymerization MINNESOTA MINING & MFG (US) 1995-11-08 EP disclosed
US-5124417-A Comprising an organic onium cation and a nonnucleophilic, partially-fluorinated hydrocarbylsulfonato metallate; high-molecular-weight polymers from epoxides, tetrahydrofurans, oxazolines, vinyls, lactones, etc. MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-06-23 US disclosed
US-5084586-A Polymerization catalysts MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-01-28 US disclosed
EP-0442635-A1 Novel initiators for cationic polymerization MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-08-21 EP disclosed
JP-S6131426-A MODIFIED PHENOLIC RESIN COMPOSITION SHOWA HIGHPOLYMER CO LTD 1986-02-13 JP disclosed