SCHEMBL55156

SCHEMBL55156

CC[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL28231734 0.93
SCHEMBL4530964 0.93
Water SCHEMBL27316438 0.93
Bromide SCHEMBL5823710 0.93
Hydrochloric Acid SCHEMBL2275736 0.93
Bromide SCHEMBL10578713 0.93
Methane SCHEMBL9322966 0.93
Hydrochloric Acid SCHEMBL6263034 0.93
Hydrochloric Acid SCHEMBL6263039 0.93
SCHEMBL8580348 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 11169 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026097205-A1 DISILANE PREPARATION DEVICE AND DISILANE PREPARATION METHOD 中船(邯郸)派瑞特种气体股份有限公司 2026-05-15 WO claimed
US-20260090068-A1 SEMICONDUCTOR DEVICE AND METHODS OF FORMATION TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2026-03-26 US claimed
US-20250372373-A1 GATE-ALL-AROUND (GAA) INTERFACE MODIFICATIONS TO IMPROVE ABRUPTNESS APPLIED MATERIALS INC (US) 2025-12-04 US claimed
US-20250338599-A1 SEMICONDUCTOR GATE STRUCTURE AND METHODS OF FORMING THE SAME TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-10-30 US claimed
US-20250243579-A1 DLC COATING AND PREPARATION METHOD AND DEVICE THEREFOR, COMPOSITE COATING LAYER AND COATED PRODUCT JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2025-07-31 US claimed
WO-2025125426-A1 COMPOSITION AND SOLID ELECTROLYTE ARKEMA FRANCE (FR) 2025-06-19 WO claimed
WO-2025125489-A1 TITLE: COMPOSITION AND SOLID ELECTROLYTE ARKEMA FRANCE (FR) 2025-06-19 WO claimed
CN-116196967-B Modified oxidation catalytic material and preparation method and application thereof 中国石油化工股份有限公司 2025-06-10 CN claimed
CN-119736062-B Preparation method of ethyl-dehydrolactoate-type silicone sealant 山东永安胶业有限公司 2025-06-03 CN claimed
CN-119972031-A Cyclodextrin chiral chromatographic stationary phase and preparation method thereof 河北石油职业技术大学 2025-05-13 CN claimed
WO-1990012420-A1 DIELECTRIC SUBSTRATE WITH REDUCED AND STABILIZED SURFACE ELECTRICAL CONDUCTIVITY, PROCESS FOR ITS MANUFACTURE, AND USE OF THE SUBSTRATE AVL GESELLSCHAFT FÜR VERBRENNUNGSKRAFTMASCHINEN UND MESSTECHNIK MBH, PROF.DR.DR.H.C. HANS LIST (AT) 1990-10-18 WO claimed
CN-1043776-A Self-lubricating bearing material HUANG GENBAO (CN) 1990-07-11 CN claimed
EP-0376870-A1 A new organosilylpolyphosphoric reagent, its preparation and application to the process of synthesis of 3-carboxyquinolones or azaquinolones and their salts CENTRO MARGA PARA LA INVESTIGACION S.A. (ES) 1990-07-04 EP claimed
US-4912242-A Process for preparing silicon esters DOW CORNING CORPORATION (US) 1990-03-27 US claimed
EP-0128721-B1 SILICA-MODIFIED CATALYST AND USE FOR SELECTIVE PRODUCTION OF PARA-DIALKYL SUBSTITUTED BENZENES MOBIL OIL CORPORATION (US) 1989-07-26 EP claimed
US-4781942-A Process for the photochemical vapor deposition of siloxane polymers HUGHES AIRCRAFT COMPANY (US) 1988-11-01 US claimed
EP-0248748-A1 Processes for manufacturing mineral membranes and powder of mixed oxides of titanium and silicon CENTRE MERIDIONAL D'OENOLOGIE Société Anonyme dite: (FR) 1987-12-09 EP claimed
CN-87103755-A Siloxane-based synthetic fiber finishing agent 1987-12-09 CN claimed
EP-0104846-B1 THIN FILM ELECTROLUMINESCENCE DEVICE AND METHOD OF MANUFACTURING THE SAME KABUSHIKI KAISHA TOSHIBA (JP) 1987-03-25 EP claimed
US-4196139-A Process for the production of ethylsilanes DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) 1980-04-01 US claimed