⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL3084 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL3038547 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL5329992 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL301950 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL10979901 | 1.00 | — | — | |
| Bromide SCHEMBL9093768 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL8089966 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL6756047 | 0.82 | — | — | |
| Fluoride SCHEMBL3038548 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL8933690 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115101420-A | Manufacturing method of groove type power device | 广州粤芯半导体技术有限公司 | 2022-09-23 | — | — | CN | claimed |
| CN-112897466-A | Method for producing anhydrous hydrogen fluoride by using fluosilicic acid in phosphoric acid | 贵州省化工研究院 | 2021-06-04 | — | — | CN | claimed |
| CN-112320821-A | Method for producing high-purity potassium fluoride by using fluosilicic acid in phosphoric acid | 贵州省化工研究院 | 2021-02-05 | — | — | CN | claimed |
| CN-112320820-A | Method for producing high-purity sodium fluoride by utilizing fluosilicic acid in phosphoric acid | 贵州省化工研究院 | 2021-02-05 | — | — | CN | claimed |
| US-8658490-B2 | Passivating point defects in high-K gate dielectric layers during gate stack formation | GLOBALFOUNDRIES INC. (KY) | 2014-02-25 | — | — | US | claimed |
| US-20130267086-A1 | PASSIVATING POINT DEFECTS IN HIGH-K GATE DIELECTRIC LAYERS DURING GATE STACK FORMATION | GLOBALFOUNDRIES INC. (KY) | 2013-10-10 | — | — | US | claimed |
| EP-0449892-A4 | EXTRACTION AND PURIFICATION OF TITANIUM PRODUCTS FROM TITANIUM BEARING MINERALS | — | 1992-06-03 | — | — | EP | claimed |
| EP-0449892-A1 | EXTRACTION AND PURIFICATION OF TITANIUM PRODUCTS FROM TITANIUM BEARING MINERALS. | UNIV MELBOURNE (AU) | 1991-10-09 | — | — | EP | claimed |
| WO-1990006898-A1 | EXTRACTION AND PURIFICATION OF TITANIUM PRODUCTS FROM TITANIUM BEARING MINERALS | THE UNIVERSITY OF MELBOURNE (AU) | 1990-06-28 | — | — | WO | claimed |
| JP-63154945-A | — | — | None | — | — | JP | disclosed |
| CN-117509548-B | Method for preparing hydrofluoric acid and co-producing white carbon black by fluosilicic acid | 云南氟磷电子科技有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-220851755-U | Place stable steel lining tetrafluoro storage tank | 江苏亚氟隆防腐科技有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-113066834-B | Display device, display panel and manufacturing method thereof | 合肥鑫晟光电科技有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-117509548-A | Method for preparing hydrofluoric acid and co-producing white carbon black by fluosilicic acid | 云南氟磷电子科技有限公司 | 2024-02-06 | — | — | CN | disclosed |
| US-20100073613-A1 | LIQUID CRYSTAL DISPLAY PANEL, LIQUID CRYSTAL DISPLAY UNIT, LIQUID CRYSTAL DISPLAY DEVICE, TELEVISION RECEIVER, AND METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE | SHARP KABUSHIKI KAISHA (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20090057682-A1 | ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, TELEVISION RECEIVER, MANUFACTURING METHOD OF ACTIVE MATRIX SUBSTRATE, FORMING METHOD OF GATE INSULATING FILM | SHARP KABUSHIKI KAISHA (JP) | 2009-03-05 | — | — | US | disclosed |
| CN-1565710-A | Apparatus and method for point-of-use treatment of effluent gas streams | ADVANCED TECH MATERIALS (US) | 2005-01-19 | — | — | CN | disclosed |
| CN-1367713-A | Apparatus and method for on-site treatment of an exhaust gas stream | ADVANCED TECH MATERIALS (US) | 2002-09-04 | — | — | CN | disclosed |
| US-5672325-A | Method for the oxidation treatment of decaborane gas | JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) | 1997-09-30 | — | — | US | disclosed |
| JP-S63154945-A | ANALYSIS OF GLASS | SEIKO EPSON CORP | 1988-06-28 | — | — | JP | disclosed |