⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL817964 | 0.97 | — | — | |
| SCHEMBL2964602 | 0.91 | — | — | |
| Cyclopropane SCHEMBL3206743 | 0.91 | — | — | |
| SCHEMBL1143089 | 0.76 | — | — | |
| SCHEMBL372625 | 0.73 | — | — | |
| SCHEMBL8832908 | 0.71 | — | — | |
| SCHEMBL495516 | 0.71 | MEN1 (0.32) | — | |
| SCHEMBL372481 | 0.69 | — | — | |
| SCHEMBL495411 | 0.69 | — | — | |
| SCHEMBL1275977 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114907813-A | Single-component condensed type silicone sealant resistant to long-time water boiling and preparation method thereof | 广州以恒有机硅有限公司 | 2022-08-16 | — | — | CN | claimed |
| CN-113416092-B | Double-component nano sol type liquid hardening agent and preparation method thereof | 浙江大学杭州国际科创中心 | 2022-04-12 | — | — | CN | claimed |
| CN-113416092-A | Double-component nano sol type liquid hardening agent and preparation method thereof | 浙江大学杭州国际科创中心 | 2021-09-21 | — | — | CN | claimed |
| CN-117178078-A | Aqueous chromium-free surface treatment agent, surface treatment metal and surface treatment method | 日涂表面处理化工有限公司 | 2023-12-05 | — | — | CN | disclosed |
| US-11773273-B2 | Aqueous primer | JOTUN A/S (NO) | 2023-10-03 | — | — | US | disclosed |
| CN-116783264-A | Method for incorporating gelation and phase separation inhibitors into filled polyurethane reactive hot melt adhesives | 汉高股份有限及两合公司 | 2023-09-19 | — | — | CN | disclosed |
| EP-3080209-B2 | COATED METAL PIGMENTS, METHOD FOR THE PRODUCTION AND THE USE THEREOF, COATING AGENT AND ARTICLE | ECKART GMBH (DE) | 2023-06-14 | — | — | EP | disclosed |
| EP-3408335-B1 | SHOP PRIMER | JOTUN AS (NO) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022209453-A1 | AQUEOUS CHROME-FREE SURFACE TREATMENT AGENT, SURFACE TREATMENT METAL, AND SURFACE TREATMENT METHOD | 日本ペイント・サーフケミカルズ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| CN-114907813-A | Single-component condensed type silicone sealant resistant to long-time water boiling and preparation method thereof | 广州以恒有机硅有限公司 | 2022-08-16 | — | — | CN | disclosed |
| CN-110698961-B | Chromium-free metal surface treatment agent, metal surface treatment method and metal base material | 日涂表面处理化工有限公司 | 2022-08-02 | — | — | CN | disclosed |
| US-20120031302-A1 | AQUEOUS SILANE SYSTEMS BASED ON TRIS(ALKOXYSILYLALKYL)AMINES AND THE USE THEREOF | EVONIK DEGUSSA GMBH (DE) | 2012-02-09 | — | — | US | disclosed |
| US-20110268899-A1 | AQUEOUS SILANE SYSTEMS BASED ON BIS(TRIALKOXYSILYLALKYL)AMINES | EVONIK DEGUSSA GMBH (DE) | 2011-11-03 | — | — | US | disclosed |
| WO-2011103939-A1 | COMPOSITIONS OF METAL OXIDES FUNCTIONALISED BY OLIGOMER SILOXANOLS AND USE THEREOF | EVONIK DEGUSSA GMBH (DE) | 2011-09-01 | — | — | WO | disclosed |
| US-7943531-B2 | Methods for forming a silicon oxide layer over a substrate | APPLIED MATERIALS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| WO-2010121872-A1 | AQUEOUS SILANE SYSTEMS BASED ON TRIS(ALKOXYSILYLALKYL)AMINES AND THE USE THEREOF | EVONIK DEGUSSA GMBH (DE) | 2010-10-28 | — | — | WO | disclosed |
| US-20090208880-A1 | PROCESS SEQUENCE FOR FORMATION OF PATTERNED HARD MASK FILM (RFP) WITHOUT NEED FOR PHOTORESIST OR DRY ETCH | APPLIED MATERIALS, INC. (US) | 2009-08-20 | — | — | US | disclosed |
| US-20090104791-A1 | Methods for Forming a Silicon Oxide Layer Over a Substrate | APPLIED MATERIALS, INC. A DELAWARE CORPORATION (US) | 2009-04-23 | — | — | US | disclosed |
| US-7498273-B2 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes | APPLIED MATERIALS, INC. (US) | 2009-03-03 | — | — | US | disclosed |
| US-20070281495-A1 | FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES | APPLIED MATERIALS, INC. (US) | 2007-12-06 | — | — | US | disclosed |