Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ether SCHEMBL15994036 | 0.96 | TDP1 (0.52) | TDP1HSD17B10ALDH1A1 | |
| Ether SCHEMBL5183492 | 0.96 | TDP1 (0.53) | TDP1HSD17B10MAPK1ALDH1A1 | |
| SCHEMBL21177782 | 0.90 | TDP1 (0.52) | TDP1HSD17B10MAPK1 | |
| Alcohol SCHEMBL16163804 | 0.90 | TDP1 (0.55) | TDP1HSD17B10MAPK1 | |
| SCHEMBL7615057 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 | |
| SCHEMBL18322329 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 | |
| SCHEMBL15169 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 | |
| SCHEMBL3185056 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 | |
| SCHEMBL268561 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 | |
| SCHEMBL15029 | 0.89 | TDP1 (0.54) | TDP1HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2395 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12565618-B2 | Di-alkyl chain surfactants as a main surfactant for enhancing oil recovery for tight oil formations | CNPC USA CORPORATION (US) | 2026-03-03 | — | — | US | claimed |
| EP-4693565-A1 | ELECTROLYTE FOR ANODE-FREE LITHIUM METAL BATTERY AND ANODE-FREE LITHIUM METAL BATTERY COMPRISING SAME | Samsung SDI Co., Ltd. (KR) | 2026-02-11 | — | — | EP | claimed |
| US-12545862-B2 | Method for producing decomposing/cleaning composition | RESONAC CORPORATION (JP) | 2026-02-10 | — | — | US | claimed |
| US-20250257242-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-08-14 | — | — | US | claimed |
| CN-115268215-B | Photosensitive polyimide resin composition, photosensitive polyimide film containing photosensitive polyimide resin composition and application of photosensitive polyimide film | 吉林奥来德光电材料股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-119980704-A | Fluorine-free waterproof agent and preparation method thereof | 宁波润禾高新材料科技股份有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-114995058-B | Resin precursor composition, polyimide resin film containing resin precursor composition and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119926670-A | Efficient flotation separation method for arsenic-containing copper-molybdenum ore | 中铝秘鲁矿业公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119932917-A | High-stripping water-resistant fluoride-free waterproof agent and preparation method thereof | 杭州传化精细化工有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119781246-A | Photosensitive polyimide resin composition, cured film, and preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| EP-0441284-A2 | Process for reducing the undesirable halide content of epoxyresins | THE DOW CHEMICAL COMPANY (US) | 1991-08-14 | — | — | EP | claimed |
| EP-0236497-B1 | COATING COMPOSITIONS AND METHOD FOR IMPROVING THE PROPERTIES OF COATED SUBSTRATES | COATINGS FOR INDUSTRY, INC. (US) | 1991-07-31 | — | — | EP | claimed |
| US-5010125-A | Room temperature plain paper ink | XAAR LIMITED (GB) | 1991-04-23 | — | — | US | claimed |
| EP-0408333-A1 | Jet printing ink and method | XAAR LIMITED (GB) | 1991-01-16 | — | — | EP | claimed |
| EP-0403272-A1 | Jet printing ink and method | XAAR LIMITED (GB) | 1990-12-19 | — | — | EP | claimed |
| EP-0386349-A1 | Jet printing ink compositions | XAAR LIMITED (GB) | 1990-09-12 | — | — | EP | claimed |
| US-4822514-A | Compositions and methods for cleaning surfaces while selectively imparting gloss or shine thereto | MURPHY-PHOENIX COMPANY (US) | 1989-04-18 | — | — | US | claimed |
| US-4786327-A | Dye preparation for thermal ink-jet printheads using ion exchange | HEWLETT-PACKARD COMPANY (US) | 1988-11-22 | — | — | US | claimed |
| US-4780235-A | LOW TOXICITY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-10-25 | — | — | US | claimed |
| EP-0262821-A2 | Dye preparation for thermal ink-jet printheads using a one step ion exchange process | Hewlett-Packard Company (US) | 1988-04-06 | — | — | EP | claimed |