Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1552881 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL1003101 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL20558042 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL133259 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL21631024 | 0.91 | — | — | |
| SCHEMBL863596 | 0.91 | TSHR (0.50) | TSHR | |
| SCHEMBL7715555 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL20557983 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL22405661 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL11003294 | 0.91 | TSHR (0.40) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119768742-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119563142-A | Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid | 日产化学株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119487453-A | Method for manufacturing laminate and method for manufacturing semiconductor element | 日产化学株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-112947000-B | Composition for forming silicon-containing EUV resist underlayer film containing sulfonate | 日产化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-115362216-B | Composition for forming film | 日产化学株式会社 | 2024-07-19 | — | — | CN | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-117716295-A | Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117255971-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117157738-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-117157739-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| CN-108885997-B | Planarization method for semiconductor substrate using silicon-containing composition | 日产化学株式会社 | 2023-06-02 | — | — | CN | disclosed |
| US-7208256-B2 | Toner for image formation, method of producing the toner, toner container, toner cartridge, process cartridge, and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2007-04-24 | — | — | US | disclosed |
| US-20050026066-A1 | Toner for image formation, method of producing the toner, toner container, toner cartridge, process cartridge, and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2005-02-03 | — | — | US | disclosed |