Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.48 |
| ▸ | TP53 | P04637 | 3/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | MGAM | O43451 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | SI | P14410 | 1/20 | 0.34 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Ethyl Ester SCHEMBL17241202 | 0.98 | TSHR (0.52) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3766624 | 0.96 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3687226 | 0.94 | TSHR (0.54) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL4139149 | 0.94 | TSHR (0.60) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL630871 | 0.90 | TSHR (0.59) | TSHRHPGDALDH1A1TP53HIF1A | |
| Ether SCHEMBL1088054 | 0.90 | TSHR (0.63) | TSHRHPGDALDH1A1TP53HIF1A | |
| Triethylene Glycol SCHEMBL1412314 | 0.89 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| Tetraethylene Glycol SCHEMBL5685347 | 0.89 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL10596327 | 0.88 | TSHR (0.61) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3171614 | 0.87 | TSHR (0.56) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106356194-B | A kind of polyacrylamide solid union polymer dielectric and preparation method thereof | 东莞理工学院 | 2018-08-07 | — | — | CN | claimed |
| CN-1737684-A | Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP comprising the PDP electrode | SAMSUNG SDI CO LTD (KR) | 2006-02-22 | — | — | CN | claimed |
| CN-1707359-A | Photosensitive paste composition, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO LTD (KR) | 2005-12-14 | — | — | CN | claimed |
| US-20200407579-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK COMPOSITION | OSAKA SODA CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| CN-106147661-B | Pressure-sensitive adhesive | Tessa Europe Co.Ltd. (DE) | 2019-11-01 | — | — | CN | disclosed |
| CN-109960109-A | The application of dispersing agent and photosensitive resin composition and the two | 北京鼎材科技有限公司 | 2019-07-02 | — | — | CN | disclosed |
| CN-104423167-B | Black photosensitive resin composition and the light blocking layer for using the black photosensitive resin composition | 第一毛织株式会社 | 2019-05-31 | — | — | CN | disclosed |
| CN-109796163-A | A kind of anti-shrinkage concrete and its preparation process | 浙江三门永泰建材有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104570604-B | Photosensitive resin composition and the light blocking layer for using it | 第毛织株式会社 | 2019-01-25 | — | — | CN | disclosed |
| CN-109031888-A | Colored photosensitive resin composition and light shield spacer prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2018-12-18 | — | — | CN | disclosed |
| CN-109031886-A | Photosensitive composition and shading spacer prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2018-12-18 | — | — | CN | disclosed |
| CN-1869816-A | Photosensitive composition and color filter formed thereof | TOKYO OHKA KOGYO CO LTD (JP) | 2006-11-29 | — | — | CN | disclosed |
| CN-1782874-A | Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2006-06-07 | — | — | CN | disclosed |
| CN-1770013-A | Photosensitive composition for shading-film forming and black matrix formed therefrom | TOKYO OHKA KOGYO CO LTD (JP) | 2006-05-10 | — | — | CN | disclosed |
| CN-1737684-A | Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP comprising the PDP electrode | SAMSUNG SDI CO LTD (KR) | 2006-02-22 | — | — | CN | disclosed |
| CN-1707359-A | Photosensitive paste composition, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO LTD (KR) | 2005-12-14 | — | — | CN | disclosed |
| CN-1183423-C | Photosensitive composition for sandblasting and photosensitive film comprising the same | �����껯��ҵ��ʽ���� | 2005-01-05 | — | — | CN | disclosed |
| CN-1305124-A | Photosensitive resin composition | CIBA SC HOLDING AG (CH) | 2001-07-25 | — | — | CN | disclosed |
| CN-1245300-A | Photosensitive composition for sand milling and photosensitive film laminate containing same | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2000-02-23 | — | — | CN | disclosed |
| CN-1220415-A | Photosensitive composition for sandblasting and photosensitive film comprising the same | TOKYO OHKA KOGYO CO LTD (JP) | 1999-06-23 | — | — | CN | disclosed |