Bromide

Bromide

SCHEMBL557590

Br.CCN1C=CN(CC)C1

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL2121618 1.00
Iodide SCHEMBL1758303 0.93
Hydrochloric Acid SCHEMBL557288 0.93
Fluoride SCHEMBL1898729 0.93
Bromide SCHEMBL2760953 0.87
SCHEMBL23044740 0.85
SCHEMBL29160556 0.85
SCHEMBL27658453 0.85
SCHEMBL29217818 0.85
SCHEMBL372458 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240009613-A1 CO2 CAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES AGARWAL, Shantanu 2024-01-11 US claimed
EP-4196246-A1 &lt;SUP2/&gt;? &lt;SUB2/&gt;?2?COCAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES Susteon Inc. (US) 2023-06-21 EP claimed
WO-2022040072-A1 CO2 CAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES SUSTEON INC. (US) 2022-02-24 WO claimed
US-9926404-B2 Curing compositions AQDOT LIMITED (GB) 2018-03-27 US claimed
EP-3095804-B1 CURING COMPOSITIONS AQDOT LTD (GB) 2017-09-27 EP claimed
US-20160340467-A1 CURING COMPOSITIONS AQDOT LIMITED (GB) 2016-11-24 US claimed
EP-3095804-A1 CURING COMPOSITIONS Aqdot Ltd (GB) 2016-11-23 EP claimed
CN-114700024-B One-step process for realizing continuous synthesis and separation of ionic liquid by using membrane reactor and membrane reactor thereof 杭州师范大学 2024-02-27 CN disclosed
US-20240009613-A1 CO2 CAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES AGARWAL, Shantanu 2024-01-11 US disclosed
CN-116813468-A 4-halogeno-5-substituted phthalic acid and preparation method thereof 中国石油化工股份有限公司 2023-09-29 CN disclosed
EP-4196246-A1 &lt;SUP2/&gt;? &lt;SUB2/&gt;?2?COCAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES Susteon Inc. (US) 2023-06-21 EP disclosed
WO-2022040072-A1 CO2 CAPTURE SORBENTS WITH LOW REGENERATION TEMPERATURE AND HIGH DESORPTION RATES SUSTEON INC. (US) 2022-02-24 WO disclosed
CN-107743502-B Curing composition 爱客多有限公司 2020-08-28 CN disclosed
US-20110150736-A1 IONIC COMPOUND, METHOD FOR PRODUCING THE SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING THE SAME NIPPON SHOKUBAI CO., LTD. (JP) 2011-06-23 US disclosed
EP-2327707-A1 IONIC COMPOUND, PROCESS FOR PRODUCING SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING SAME Nippon Shokubai Co., Ltd. (JP) 2011-06-01 EP disclosed
US-20100285322-A1 Electric Al-Zr Alloy Plating Bath Using Room Temperature Molten Salt Bath and Plating Method Using the Same DIPSOL CHEMICALS CO., LTD. (JP) 2010-11-11 US disclosed
CN-101265268-B Ionic rare earth metal organic coordination polymer and preparation method thereof INST PROCESS ENG CAS 2010-08-25 CN disclosed
EP-2130949-A1 ELECTRIC Al-Zr ALLOY PLATING BATH USING ROOM TEMPERATURE MOLTEN SALT BATH AND PLATING METHOD USING THE SAME Dipsol Chemicals Co., Ltd. (JP) 2009-12-09 EP disclosed
CN-101265268-A Ionic rare earth metal organic coordination polymer and preparation method thereof INST PROCESS ENG CAS (CN) 2008-09-17 CN disclosed
US-6025457-A POLYMERIZABLE IMIDAZOLIUM DERIVATIVE; HEAT RESISTANCE SHIKOKU CHEMICALS CORPORATION (JP) 2000-02-15 US disclosed