Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL225302 | 1.00 | — | — | |
| Bromide SCHEMBL8606201 | 1.00 | — | — | |
| Bromide SCHEMBL27997867 | 1.00 | — | — | |
| Bromide SCHEMBL28244064 | 0.82 | — | — | |
| Bromide SCHEMBL29204918 | 0.82 | — | — | |
| Bromide SCHEMBL28166870 | 0.82 | — | — | |
| Bromide SCHEMBL5571107 | 0.82 | — | — | |
| Bromide SCHEMBL15227780 | 0.82 | — | — | |
| Bromide SCHEMBL2525307 | 0.82 | — | — | |
| SCHEMBL15729 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113451092-B | Charged particle beam source | FEI 公司 | 2023-05-30 | — | — | CN | claimed |
| US-11380511-B2 | Charged particle beam source | FEI COMPANY (US) | 2022-07-05 | — | — | US | claimed |
| CN-113347864-B | Protective film for preventing infrared laser information leakage and electromagnetic information leakage | 成都立鑫新技术科技有限公司 | 2021-11-12 | — | — | CN | claimed |
| US-20210305006-A1 | CHARGED PARTICLE BEAM SOURCE | FEI COMPANY (US) | 2021-09-30 | — | — | US | claimed |
| EP-3886137-A1 | CHARGED PARTICLE BEAM SOURCE | FEI Company (US) | 2021-09-29 | — | — | EP | claimed |
| CN-113451092-A | Charged particle beam source | FEI 公司 | 2021-09-28 | — | — | CN | claimed |
| CN-113347864-A | Protective film for preventing infrared laser information leakage and electromagnetic information leakage | 成都立鑫新技术科技有限公司 | 2021-09-03 | — | — | CN | claimed |
| US-12160264-B2 | Optical wireless communication (OWC) unit | PURELIFI LIMITED (GB) | 2024-12-03 | — | — | US | disclosed |
| US-20230344515-A1 | OPTICAL WIRELESS COMMUNICATION (OWC) UNIT | PURELIFI LIMITED (GB) | 2023-10-26 | — | — | US | disclosed |
| CN-113451092-B | Charged particle beam source | FEI 公司 | 2023-05-30 | — | — | CN | disclosed |
| US-11380511-B2 | Charged particle beam source | FEI COMPANY (US) | 2022-07-05 | — | — | US | disclosed |
| CN-216087423-U | Prevent protection film that information revealed | 成都立鑫新技术科技有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-113347864-B | Protective film for preventing infrared laser information leakage and electromagnetic information leakage | 成都立鑫新技术科技有限公司 | 2021-11-12 | — | — | CN | disclosed |
| US-7067809-B2 | Method and apparatus for multiple charged particle beams | APPLIED MATERIALS, INC. (US) | 2006-06-27 | — | — | US | disclosed |
| US-20060108531-A1 | Method and apparatus for multiple charged particle beams | APPLIED MATERIALS INC. | 2006-05-25 | — | — | US | disclosed |
| US-20050230633-A1 | Method and apparatus for multiple charged particle beams | APPLIED MATERIALS INC. | 2005-10-20 | — | — | US | disclosed |
| US-6750455-B2 | Method and apparatus for multiple charged particle beams | APPLIED MATERIALS, INC. | 2004-06-15 | — | — | US | disclosed |
| US-20030001095-A1 | Method and apparatus for multiple charged particle beams | SCHLUMBERGER TECHNOLOGIES, INC. | 2003-01-02 | — | — | US | disclosed |
| EP-0304114-A1 | Charged particle apparatus comprising a beam discriminator | Koninklijke Philips Electronics N.V. (NL) | 1989-02-22 | — | — | EP | disclosed |
| EP-0162950-B1 | METHOD FOR DIFFUSING A CONDUCTIVITY DETERMINING IMPURITY IN A SEMICONDUCTOR SUBSTRATE AND MAKING ELECTRICAL CONTACT THERETO | International Business Machines Corporation (US) | 1988-01-27 | — | — | EP | disclosed |