SCHEMBL5584255

SCHEMBL5584255

[CH2]CC(C)[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL477869 0.73
SCHEMBL9022254 0.72
SCHEMBL548611 0.72
SCHEMBL3515 0.70
SCHEMBL28658154 0.70
SCHEMBL28355455 0.70
SCHEMBL2304173 0.70
SCHEMBL9021849 0.68
SCHEMBL22498578 0.67
SCHEMBL15301 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10717866-B2 Organic-inorganic hybrid composition, and article and optical component including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-07-21 US disclosed
EP-2700705-B1 LIQUID DETERGENT COMPOSITION KAO CORP (JP) 2018-12-19 EP disclosed
US-20180244915-A1 ORGANIC-INORGANIC HYBRID COMPOSITION, AND ARTICLE AND OPTICAL COMPONENT INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-08-30 US disclosed
EP-2940118-B1 LIQUID DETERGENT COMPOSITION FOR CLOTHING KAO CORP (JP) 2018-03-28 EP disclosed
US-9598663-B2 Liquid detergent composition for clothing KAO CORPORATION (JP) 2017-03-21 US disclosed
EP-3137546-A1 FLAME-RETARDANT POLYESTER COMPOSITION AND ARTICLE SABIC Global Technologies B.V. (NL) 2017-03-08 EP disclosed
US-20150337244-A1 LIQUID DETERGENT COMPOSITION FOR CLOTHING KAO CORPORATION (JP) 2015-11-26 US disclosed
EP-2940118-A1 LIQUID DETERGENT COMPOSITION FOR CLOTHING Kao Corporation (JP) 2015-11-04 EP disclosed
WO-2015163996-A1 FLAME-RETARDANT POLYESTER COMPOSITION AND ARTICLE SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2015-10-29 WO disclosed
US-9046769-B2 Pattern-forming method, and composition for forming resist underlayer film JSR CORPORATION (JP) 2015-06-02 US disclosed
US-8859191-B2 Pattern-forming method, and composition for forming resist underlayer film JSR CORPORATION (JP) 2014-10-14 US disclosed
EP-2700705-A1 LIQUID DETERGENT COMPOSITION Kao Corporation (JP) 2014-02-26 EP disclosed
US-20120285929-A1 PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2012-11-15 US disclosed
US-7196199-B2 Antiserotonine agents; antidepressants MITSUBISHI PHARMA CORPORATION (JP) 2007-03-27 US disclosed
EP-1188747-B1 PHENOXYPROPYLAMINE COMPOUNDS MITSUBISHI PHARMA CORP (JP) 2005-09-07 EP disclosed
US-20040138227-A1 Phenoxypropylamine compounds NISHIYAMA AKIRA 2004-07-15 US disclosed
US-6720320-B2 ANTISEROTONINE AGENTS MITSUBISHI PHARMA CORPORATION (JP) 2004-04-13 US disclosed
US-20020111358-A1 Phenoxypropylamine compounds MITSUBISHI PHARMA CORPORATION (JP) 2002-08-15 US disclosed
EP-1188747-A1 PHENOXYPROPYLAMINE COMPOUNDS Mitsubishi Pharma Corporation (JP) 2002-03-20 EP disclosed
US-4070276-A Flotation process of lead-, copper-, uranium- and rare earth minerals BEROL KEMI AB (SW) 1978-01-24 US disclosed