⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18171048 | 0.93 | — | — | |
| SCHEMBL17985465 | 0.93 | — | — | |
| SCHEMBL5194408 | 0.93 | — | — | |
| SCHEMBL5663986 | 0.93 | — | — | |
| SCHEMBL18171040 | 0.93 | — | — | |
| SCHEMBL6555802 | 0.93 | — | — | |
| SCHEMBL18171050 | 0.93 | — | — | |
| SCHEMBL7914411 | 0.93 | — | — | |
| SCHEMBL10901270 | 0.93 | — | — | |
| SCHEMBL29249999 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3248 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12622243-B2 | Selective liner deposition for via resistance reduction | APPLIED MATERIALS, INC. (US) | 2026-05-05 | — | — | US | claimed |
| US-12612697-B2 | Methods for depositing silicon films by atomic layer deposition | MICRON TECHNOLOGY, INC. (US) | 2026-04-28 | — | — | US | claimed |
| EP-4728113-A1 | METHODS FOR DEPOSITING SILICON FILMS BY ATOMIC LAYER DEPOSITION | MICRON TECHNOLOGY, INC. (US) | 2026-04-22 | — | — | EP | claimed |
| US-12570665-B2 | Compositions comprising fullerenyl mesochlorin nano-photosensitizers with covalently bound antibiotics and their uses in combination therapy | UNIVERSITY OF MASSACHUSETTS (US) | 2026-03-10 | — | — | US | claimed |
| EP-4679997-A1 | PEROVSKITE COMPOSITE COMPRISING PSEUDOHALIDE ADDITIVE, ELECTRONIC DEVICE COMPRISING SAME, AND MANUFACTURING METHOD THEREOF | POSTECH Research and Business Development Foundation (KR) | 2026-01-14 | — | — | EP | claimed |
| EP-4649182-A1 | ATOMIC LAYER DEPOSITION USING TIN-BASED OR GERMANIUM-BASED PRECURSORS | MICRON TECHNOLOGY, INC. (US) | 2025-11-19 | — | — | EP | claimed |
| US-12473646-B2 | Methods for depositing carbon conducting films by atomic layer deposition | MICRON TECHNOLOGY, INC. (US) | 2025-11-18 | — | — | US | claimed |
| US-20250152590-A1 | NURR1:RXR ACTIVATING COMPOUNDS FOR SIMULTANEOUS TREATMENT OF SYMPTOMS AND PATHOLOGY OF PARKINSON'S DISEASE | VASSILATIS DEMETRIOS K (GR) | 2025-05-15 | — | — | US | claimed |
| CN-119552117-A | AIE type fluorescent probe with tumor targeting and preparation and application thereof | 西安电子科技大学 | 2025-03-04 | — | — | CN | claimed |
| US-20250059646-A1 | METHODS FOR DEPOSITING GERMANIUM FILMS BY ATOMIC LAYER DEPOSITION | MICRON TECHNOLOGY, INC. | 2025-02-20 | — | — | US | claimed |
| WO-1990016014-A1 | DOPING OF SILVER HALIDE EMULSIONS WITH GROUP VIB COMPOUNDS TO FORM IMPROVED PHOTOACTIVE GRAINS | EASTMAN KODAK COMPANY (US) | 1990-12-27 | — | — | WO | claimed |
| EP-0069203-B1 | PROCESS FOR THE PREPARATION OF AROMATIC GLYCIDYL ESTERS | Degussa Aktiengesellschaft (DE) | 1986-08-13 | — | — | EP | claimed |
| US-4447335-A | THERMAL DECOMPOSITION OF CADMIUM AMMONIA THIOCYANATE, USED IN PHOTOELECTRIC OR SOLAR CELLS | ARGUS CHEMICAL CORPORATION (US) | 1984-05-08 | — | — | US | claimed |
| US-4360542-A | PHOTOELECTRIC CELLS | ARGUS CHEMICAL CORPORATION (US) | 1982-11-23 | — | — | US | claimed |
| US-4262085-A | Process for preparation of metal patterns on insulating carrier materials | SCHERING AKTIENGESELLSCHAFT (DE) | 1981-04-14 | — | — | US | claimed |
| US-4177071-A | HIGH SENSITIVITY TO PENTRATING RADIATION; INSENSITIVE TO FORMATION OF PRESSURE MARKS | AGFA-GEVAERT, N.V. (BE) | 1979-12-04 | — | — | US | claimed |
| US-4108807-A | REACTING A METALLATE WITH A PSEUDOHALIDE IN THE PRESENCE OF A PHENOL-SUBSTITUTED TERTIARY AMINE CATALYST | CHEMIC-ANLAGENBAU BISCHOFSHEIM GMBH (DE) | 1978-08-22 | — | — | US | claimed |
| US-4063008-A | DIAZOTIZATION, ALKALI METAL SELENOCYANATE | DIRECTOR-GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JA) | 1977-12-13 | — | — | US | claimed |
| US-4046569-A | PHYSICAL DEVELOPMENT OF PD(II) PHOTOSENSITIVE COMPLEXES WITH A LEUCOPHTHALOCYANINE DYE AND A REDUCING AGENT THEREFOR | EASTMAN KODAK COMPANY (US) | 1977-09-06 | — | — | US | claimed |
| US-3992511-A | BY IMMERSION IN ALKALI METAL CYANIDE | XEROX CORPORATION (US) | 1976-11-16 | — | — | US | claimed |