⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29398610 | 1.00 | — | — | |
| SCHEMBL1462442 | 1.00 | — | — | |
| SCHEMBL29397231 | 1.00 | — | — | |
| SCHEMBL19652363 | 1.00 | — | — | |
| SCHEMBL14265416 | 1.00 | — | — | |
| SCHEMBL14265415 | 1.00 | — | — | |
| SCHEMBL14351312 | 1.00 | — | — | |
| SCHEMBL64375 | 1.00 | — | — | |
| SCHEMBL61569 | 1.00 | — | — | |
| SCHEMBL30509844 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4597547-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-119768898-A | Chemical solution, method for producing modified substrate, and method for producing laminate | 富士胶片株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| CN-109507860-B | Timepiece component, timepiece movement, and timepiece | 精工爱普生株式会社 | 2022-03-01 | — | — | CN | disclosed |
| US-9947871-B2 | Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20150295176-A1 | SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-2927936-A1 | SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-10-07 | — | — | EP | disclosed |
| US-7344235-B2 | Ink composition for ink jet recording, ink cartridge, nozzle plate for ink jet recording, ink jet head, and recording apparatus | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |
| US-20070172673-A1 | Coating agents and plastic body with an antigraffiti effect and method for the production thereof | ROEHM GMBH & CO.KG (DE) | 2007-07-26 | — | — | US | disclosed |
| EP-1622988-A1 | COATING AGENTS AND PLASTIC BODY WITH AN ANTIGRAFFITI EFFECT AND METHOD FOR THE PRODUCTION THEREOF | Röhm GmbH & Co. KG (DE) | 2006-02-08 | — | — | EP | disclosed |
| WO-2004101694-A1 | COATING AGENTS AND PLASTIC BODY WITH AN ANTIGRAFFITI EFFECT AND METHOD FOR THE PRODUCTION THEREOF | Röhm GmbH & Co. KG (DE) | 2004-11-25 | — | — | WO | disclosed |