SCHEMBL5604565

SCHEMBL5604565

C1CC2OC2CC1C1COC(C2CCC3OC3C2)CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL468361 0.97
SCHEMBL15739097 0.97
SCHEMBL14396172 0.97
SCHEMBL106572 0.97
SCHEMBL22575948 0.85
SCHEMBL15707659 0.83
SCHEMBL15813209 0.81 TFPI2 (0.33)
SCHEMBL15980921 0.81 TFPI2 (0.33)
SCHEMBL658709 0.81 TFPI2 (0.33)
SCHEMBL14510049 0.81 TFPI2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202286-B2 UV-curable compositions HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2007-04-10 US claimed
EP-1232198-B1 UV-CURABLE COMPOSITIONS HUNTSMAN ADV MAT SWITZERLAND (CH) 2006-06-07 EP claimed
US-20050171228-A1 UV-curable compositions 3D SYSTEMS, INC. 2005-08-04 US claimed
US-6855748-B1 UV-curable compositions HUNTSMAN ADVANCED MATERIALS AMERICAS, INC. (US) 2005-02-15 US claimed
US-7202286-B2 UV-curable compositions HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2007-04-10 US disclosed
EP-1232198-B1 UV-CURABLE COMPOSITIONS HUNTSMAN ADV MAT SWITZERLAND (CH) 2006-06-07 EP disclosed
US-20050171228-A1 UV-curable compositions 3D SYSTEMS, INC. 2005-08-04 US disclosed