Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA4 | P22748 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | SLC18A3 | Q16572 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11217184 | 1.00 | TSHR (0.44) | TSHRCA1CA2CA4ALDH1A1 | |
| SCHEMBL10237958 | 0.92 | CA1 (0.47) | TSHRCA1CA2CA4ALDH1A1 | |
| SCHEMBL4591933 | 0.86 | CA1 (0.43) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL4612530 | 0.85 | CA1 (0.40) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL8366498 | 0.85 | CA1 (0.40) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL239138 | 0.85 | CA1 (0.40) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL6848995 | 0.85 | CA1 (0.40) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL7913340 | 0.85 | CA1 (0.40) | TSHRCA1CA2CA4SLC18A3 | |
| SCHEMBL22006157 | 0.84 | TSHR (0.31) | TSHRCA1CA2CA4 | |
| SCHEMBL13820565 | 0.84 | TSHR (0.31) | TSHRCA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7033699-A | — | — | None | — | — | JP | disclosed |
| JP-57082347-A | — | — | None | — | — | JP | disclosed |
| JP-57091954-A | — | — | None | — | — | JP | disclosed |
| US-12104015-B2 | Method for the synthesis of polyethers | UNIVERSIDAD DEL PAIS VASCO (ES) | 2024-10-01 | — | — | US | disclosed |
| EP-3792296-B1 | METHOD FOR THE SYNTHESIS OF POLYETHERS | UNIV DEL PAIS VASCO/EUSKAL HERRIKO UNIBERTSITATEA (ES) | 2023-06-14 | — | — | EP | disclosed |
| CN-112552627-B | Polymeric film and laminate comprising same | 长春石油化学股份有限公司 | 2023-04-14 | — | — | CN | disclosed |
| US-11493845-B2 | Organic bottom antireflective coating composition for nanolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-11-08 | — | — | US | disclosed |
| US-11092894-B2 | Method for forming pattern using anti-reflective coating composition comprising photoacid generator | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-08-17 | — | — | US | disclosed |
| US-20210238346-A1 | METHOD FOR THE SYNTHESIS OF POLYETHERS | UNIVERSIDAD DEL PAIS VASCO (ES) | 2021-08-05 | — | — | US | disclosed |
| CN-109312046-B | Urethane (meth) acrylate, method for producing urethane (meth) acrylate, curable composition, cured product, and method for producing cured product | 三菱瓦斯化学株式会社 | 2021-04-30 | — | — | CN | disclosed |
| US-6706827-B1 | ADDITION POLYMERIZATION, CATALYSIS; ORGANOMETALLIC, LEWIS ACID, ALUMOXANE, OR ALKYLALUMINUM CO-CATALYST | SAMSUNG ATOFINA CO. LTD. (KR) | 2004-03-16 | — | — | US | disclosed |
| US-20030180559-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. | 2003-09-25 | — | — | US | disclosed |
| EP-1298492-A2 | Coating compositions for use with an overcoated photoresist | Shipley Co. L.L.C. (US) | 2003-04-02 | — | — | EP | disclosed |
| US-6284700-B1 | COORDINATION POLYMERIZATION CATALYSTS | SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) | 2001-09-04 | — | — | US | disclosed |
| EP-0964004-A1 | New metallocene catalyst for olefin or styrene polymerization and polymerization method using the metallocene catalyst | Samsung General Chemicals Co., Ltd. (KR) | 1999-12-15 | — | — | EP | disclosed |
| JP-H0733699-A | PRODUCTION OF 1,4-DECAHYDRONAPHTHALENEDIOL | ARAKAWA CHEM IND CO LTD | 1995-02-03 | — | — | JP | disclosed |
| US-5095044-A | Odorless, discoloration inhibition | CIBA-GEIGY CORPORATION (US) | 1992-03-10 | — | — | US | disclosed |
| US-4950795-A | PRINTING PLATES, PAPER COATING | CIBA-GEIGY CORPORATION (US) | 1990-08-21 | — | — | US | disclosed |
| JP-S5791954-A | ESTER COMPOUND | SEIKO EPSON CORP | 1982-06-08 | — | — | JP | disclosed |
| JP-S5782347-A | ESTER COMPOUND | SEIKO EPSON CORP | 1982-05-22 | — | — | JP | disclosed |