SCHEMBL561337

SCHEMBL561337

CCCS(=O)(=O)[O-].CCCS(=O)(=O)[O-].[Cu+2]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.43
KDM4E B2RXH2 1/20 0.43
ALOX15 P16050 1/20 0.43
BBOX1 O75936 3/20 0.42
MAPK1 P28482 3/20 0.39
TSHR P16473 3/20 0.39
ALDH1A1 P00352 2/20 0.39
LMNA P02545 2/20 0.39
TP53 P04637 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
GMNN O75496 1/20 0.39
THPO P40225 1/20 0.39
HBB P68871 1/20 0.39
PMP22 Q01453 1/20 0.39
RECQL P46063 2/20 0.32
EPHX2 P34913 2/20 0.32
HPGD P15428 2/20 0.32
ENPEP Q07075 2/20 0.32
GLA P06280 1/20 0.32
BLM P54132 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20533801 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
Zinc Ion SCHEMBL6912620 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL20533539 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL20533645 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL20533674 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL20533537 0.93
SCHEMBL22581627 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL20533804 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL1086920 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1
SCHEMBL6916974 0.93 MAPT (0.43) MAPTKDM4EALOX15BBOX1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 345 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024131535-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-06-27 WO claimed
WO-2024131536-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-06-27 WO claimed
CN-118241266-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-06-25 CN claimed
CN-118241267-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-06-25 CN claimed
CN-117684223-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-03-12 CN claimed
CN-117684222-A Metal electroplating composition for electrolytic copper coating and application method thereof 宁波安集微电子科技有限公司 2024-03-12 CN claimed
WO-2024046450-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-03-07 WO claimed
WO-2024046447-A1 METAL ELECTROPLATING COMPOSITION FOR ELECTROLYTIC COPPER COATING AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-03-07 WO claimed
CN-112746292-B Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-04-28 CN claimed
CN-112725851-B Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-04-28 CN claimed
CN-112725851-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-04-30 CN claimed
US-8268155-B1 Copper electroplating solutions with halides NOVELLUS SYSTEMS, INC. (US) 2012-09-18 US claimed
US-8043967-B2 Process for through silicon via filling NOVELLUS SYSTEMS, INC. (US) 2011-10-25 US claimed
US-7776741-B2 Process for through silicon via filing NOVELLUS SYSTEMS, INC. (US) 2010-08-17 US claimed
US-20100200412-A1 Process For Through Silicon Via Filling NOVELLUS SYSTEMS, INC. 2010-08-12 US claimed
WO-2010022009-A2 PROCESS FOR THROUGH SILICON VIA FILLING NOVELLUS SYSTEMS, INC. (US) 2010-02-25 WO claimed
US-20100041226-A1 Process For Through Silicon Via Filing NOVELLUS SYSTEMS, INC. 2010-02-18 US claimed
EP-1338031-A2 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORPORATION (US) 2003-08-27 EP claimed
WO-2002045142-A9 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORP (US) 2003-02-06 WO claimed
WO-2002045142-A2 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORPORATION (US) 2002-06-06 WO claimed