SCHEMBL5616840

SCHEMBL5616840

C=CCC(N)C(N)(CC=C)CC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1137318 0.73
SCHEMBL16634726 0.73
SCHEMBL5964881 0.73
SCHEMBL1414480 0.72
SCHEMBL2052883 0.72
SCHEMBL361811 0.70
SCHEMBL24386934 0.69
SCHEMBL24386931 0.69
SCHEMBL7754528 0.69
SCHEMBL2986848 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107641174-B Copper (II) ion surface imprinted polymer with double exchange of anions and cations and preparation method thereof 淮海工学院 2021-03-12 CN claimed
CN-107641174-A A kind of copper (II) ion surface imprinted polymer of zwitterion double crossing over and preparation method thereof 淮海工学院 2018-01-30 CN claimed
CN-107602784-A Ion surface imprinted material of a kind of silicon substrate copper (II) and preparation method thereof 淮海工学院 2018-01-19 CN claimed
CN-107641174-B Copper (II) ion surface imprinted polymer with double exchange of anions and cations and preparation method thereof 淮海工学院 2021-03-12 CN disclosed
US-10581119-B2 Polymeric ion traps for suppressing or minimizing transition metal ions and dendrite formation or growth in lithium-ion batteries GM Global Technology Operations LLC (US) 2020-03-03 US disclosed
US-20190013551-A1 POLYMERIC ION TRAPS FOR SUPPRESSING OR MINIMIZING TRANSITION METAL IONS AND DENDRITE FORMATION OR GROWTH IN LITHIUM-ION BATTERIES GM Global Technology Operations LLC 2019-01-10 US disclosed
CN-107641174-A A kind of copper (II) ion surface imprinted polymer of zwitterion double crossing over and preparation method thereof 淮海工学院 2018-01-30 CN disclosed
CN-107602784-A Ion surface imprinted material of a kind of silicon substrate copper (II) and preparation method thereof 淮海工学院 2018-01-19 CN disclosed
EP-1789494-B1 PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS SABIC INNOVATIVE PLASTICS IP (NL) 2013-05-29 EP disclosed
EP-1789494-A1 PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS General Electric Company (US) 2007-05-30 EP disclosed
EP-1664194-A1 METHODS OF PREPARING A POLYMERIC MATERIAL COMPOSITE GENERAL ELECTRIC COMPANY (US) 2006-06-07 EP disclosed
EP-1660581-A1 METHODS OF PREPARING A POLYMERIC MATERIAL GENERAL ELECTRIC COMPANY (US) 2006-05-31 EP disclosed
EP-1660580-A1 PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS GENERAL ELECTRIC COMPANY (US) 2006-05-31 EP disclosed
WO-2006023372-A1 PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS GENERAL ELECTRIC COMPANY (US) 2006-03-02 WO disclosed
WO-2005021649-A1 METHODS OF PREPARING A POLYMERIC MATERIAL COMPOSITE GENERAL ELECTRIC COMPANY (US) 2005-03-10 WO disclosed
WO-2005021650-A1 METHODS OF PREPARING A POLYMERIC MATERIAL GENERAL ELECTRIC COMPANY (US) 2005-03-10 WO disclosed
WO-2005021648-A1 PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS GENERAL ELECTRIC COMPANY (US) 2005-03-10 WO disclosed