Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 16/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 14/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.50 |
| ▸ | AR | P10275 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.50 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.50 |
| ▸ | HTR6 | P50406 | 2/20 | 0.50 |
| ▸ | ESRRG | P62508 | 2/20 | 0.50 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | TYR | P14679 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | SHBG | P04278 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28884755 | 0.80 | ESR1 (0.65) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL9307408 | 0.80 | ESR1 (0.62) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL19843843 | 0.80 | ESR1 (0.62) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL7550167 | 0.78 | ESR1 (0.60) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL13917833 | 0.78 | MAPT (0.47) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL258649 | 0.77 | ESR1 (1.00) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL505601 | 0.77 | ESR1 (0.65) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL4433627 | 0.77 | CYP2C19 (0.44) | ESR1ESR2CYP3A4LMNAHSD17B10 | |
| SCHEMBL4704505 | 0.77 | ESR1 (0.65) | ESR1ESR2CYP3A4ARLMNA | |
| SCHEMBL28413691 | 0.76 | ESR1 (0.59) | ESR1ESR2CYP3A4ARLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1915411-A1 | NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | claimed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | claimed |
| WO-2007010385-A1 | NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-01-25 | — | — | WO | claimed |
| US-6733887-B2 | Photochromic coated high impact resistant articles | PPG INDUSTRIES OHIO, INC. | 2004-05-11 | — | — | US | claimed |
| US-6531076-B2 | Poly(urea-urethane) copolymers; impact strength | PPG INDUSTRIES OHIO, INC. | 2003-03-11 | — | — | US | claimed |
| US-20030044620-A1 | Non-elastomeric poly(urea-urethane) substrate having free isocyanato surface groups and at least a partial coating of a photochromic polymeric coating; lenses | PPG INDUSTRIES OHIO, INC. | 2003-03-06 | — | — | US | claimed |
| US-20010050356-A1 | Photochromic organic resin composition | TRANSITIONS OPTICAL LIMITED (IE) | 2001-12-13 | — | — | US | claimed |
| EP-0531408-A1 | ELECTROCHEMICAL SYNTHESIS AND SIMULTANEOUS PURIFICATION PROCESS | REILLY INDUSTRIES, INC. (US) | 1993-03-17 | — | — | EP | claimed |
| US-5074974-A | Ion exchanging | REILLY INDUSTRIES, INC. (US) | 1991-12-24 | — | — | US | claimed |
| WO-1991019020-A2 | ELECTROCHEMICAL SYNTHESIS AND SIMULTANEOUS PURIFICATION PROCESS | REILLY NDUSTRIES, INC. (US) | 1991-12-12 | — | — | WO | claimed |
| US-4439511-A | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-27 | — | — | US | claimed |
| US-11092894-B2 | Method for forming pattern using anti-reflective coating composition comprising photoacid generator | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-08-17 | — | — | US | disclosed |
| US-20160187781-A1 | METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITION COMPRISING PHOTOACID GENERATOR | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2016-06-30 | — | — | US | disclosed |
| US-20150185614-A1 | ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2015-07-02 | — | — | US | disclosed |
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-5074974-A | Ion exchanging | REILLY INDUSTRIES, INC. (US) | 1991-12-24 | — | — | US | disclosed |
| WO-1991019020-A2 | ELECTROCHEMICAL SYNTHESIS AND SIMULTANEOUS PURIFICATION PROCESS | REILLY NDUSTRIES, INC. (US) | 1991-12-12 | — | — | WO | disclosed |
| US-4439511-A | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-27 | — | — | US | disclosed |
| US-4374974-A | METHYLENE CHLORIDE AND AROMATIC DIHYDROXIDE TO PRODUCE LINEAR AND CYCLIC POLYMERS FOR USE AS FILMS | GENERAL ELECTRIC COMPANY (US) | 1983-02-22 | — | — | US | disclosed |
| EP-0069966-A1 | Photosensible mixture on the basis of o-naphthoquinone diazides, and photosensible copying material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-01-19 | — | — | EP | disclosed |