Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.80 |
| ▸ | RAB9A | P51151 | 2/20 | 0.80 |
| ▸ | MAPT | P10636 | 2/20 | 0.80 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.80 |
| ▸ | LMNA | P02545 | 4/20 | 0.79 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.79 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.79 |
| ▸ | TSHR | P16473 | 3/20 | 0.79 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.79 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.79 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.79 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.66 |
| ▸ | SCN1A | P35498 | 2/20 | 0.66 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.66 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.66 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.66 |
| ▸ | HTR1A | P08908 | 1/20 | 0.66 |
| ▸ | GAA | P10253 | 1/20 | 0.66 |
| ▸ | DRD3 | P35462 | 1/20 | 0.66 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.66 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4331340 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4330132 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL17416888 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4557168 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4345503 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL2887080 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4558859 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4334904 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4329445 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA | |
| SCHEMBL4340305 | 0.98 | NPC1 (0.83) | NPC1RAB9AMAPTALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 631 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250250460-A1 | COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS | BERTECH PANAMA S.A. (PA) | 2025-08-07 | — | — | US | claimed |
| WO-2025100921-A1 | POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME | 에스케이엔펄스 주식회사 | 2025-05-15 | — | — | WO | claimed |
| US-20250144767-A1 | POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM | ENPULSE CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| US-20250144766-A1 | POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| EP-4549090-A1 | POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM | SK enpulse Co., Ltd. (KR) | 2025-05-07 | — | — | EP | claimed |
| US-20250033160-A1 | POLISHING PAD WITH REDUCED DEFECT AND METHOD OF PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO., LTD. (KR) | 2025-01-30 | — | — | US | claimed |
| US-12122013-B2 | Composition for polishing pad and polishing pad | SK ENPULSE CO., LTD. (KR) | 2024-10-22 | — | — | US | claimed |
| US-20240342857-A1 | POLISHING PAD WITH ADJUSTED CONTENT OF CHLORINE AND PROCESS FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO., LTD. (KR) | 2024-10-17 | — | — | US | claimed |
| EP-4446057-A1 | POLISHING PAD WITH ADJUSTED CONTENT OF CHLORINE AND PROCESS FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME | SK enpulse Co., Ltd. (KR) | 2024-10-16 | — | — | EP | claimed |
| CN-117887299-A | Non-fluorine oleophobic polyurea anti-corrosion coating for petrochemical pipeline and preparation method and application thereof | 中国石油化工股份有限公司 | 2024-04-16 | — | — | CN | claimed |
| US-20040220376-A1 | Compositions for golf equipment | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2004-11-04 | — | — | US | claimed |
| US-6552155-B1 | Blocked poly(1,4-butanediol)bis(4-aminobenzoate); formulations with polyisocyanates; rapid curing when exposed to water or air humidity; anticorrosive coating, antifouling paint, caulking, sealing, waterproofing | Sawyer, Kenneth I. | 2003-04-22 | — | — | US | claimed |
| US-6401724-B1 | POLYUREA-FORMING COMPOSITION SUCH AS 1)AN AMINOBENZOIC ACID ESTER OR AMIDE OF A POSSIBLY OLIGOMERIC POLYOL OR POLYAMINE OR AN AROMATIC DIAMINE AND 2)A POLYISOCYANATE | PAR PHARMACEUTICALS INCORPORATED | 2002-06-11 | — | — | US | claimed |
| US-6403063-B1 | APPLYING POLYUREA; CURING | SAWYER KENNETH I (US) | 2002-06-11 | — | — | US | claimed |
| EP-0579989-B1 | Polyurethaneurea elastomer | IHARA CHEMICAL IND CO (JP) | 1997-09-03 | — | — | EP | claimed |
| US-5410009-A | Impact resilience; flexural properties | IHARA CHEMICAL INDUSTRY CO., LTD. (JP) | 1995-04-25 | — | — | US | claimed |
| EP-0579989-A1 | Polyurethaneurea elastomer | IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) | 1994-01-26 | — | — | EP | claimed |
| US-5086153-A | Reacting aromatic polyamine, specific aminobenzoate derivative and polyisocyanate | IHARA CHEMICAL INDUSTRY CO., LTD. (JP) | 1992-02-04 | — | — | US | claimed |
| EP-0343764-A2 | Thickened moulding resin composition | GENCORP INC. (US) | 1989-11-29 | — | — | EP | claimed |
| US-4868231-A | IN SITU FORMATION OF POLYUREAS, UNSATURATED POLYESTER | GENCORP INC. (US) | 1989-09-19 | — | — | US | claimed |