SCHEMBL5635664

SCHEMBL5635664

[Mo].[SiH4].[Si]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5635670 1.00
SCHEMBL49600 1.00
SCHEMBL14739144 1.00
SCHEMBL30254073 1.00
SCHEMBL11857510 1.00
SCHEMBL49599 1.00
SCHEMBL27817727 1.00
SCHEMBL453526 0.82
SCHEMBL10783125 0.82
SCHEMBL3477683 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111965160-A Multi-cavity Raman substrate and preparation method and application thereof 山东师范大学 2020-11-20 CN disclosed
US-20070285643-A1 Method For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatus And Methods For Operating Optical Elements And Euv-Lithography Apparatus, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The Methods CARL ZEISS SMT AG (DE) 2007-12-13 US disclosed
EP-1730597-A2 METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS, REFLECTIVE OPTICAL ELEMENTS, EUV-LITHOGRAPHY APPARATUSES AND METHODS FOR OPERATING OPTICAL ELEMENTS AND EUV-LITHOGRAPHY APPARATUSES, METHODS FOR DETERMINING THE PHASE SHIFT, METHODS FOR DETERMINING THE LAYER THICKNESS, AND APPARATUSES FOR CARRYI Carl Zeiss SMT AG (DE) 2006-12-13 EP disclosed
WO-2005091076-A2 METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS CARL ZEISS SMT AG (DE) 2005-09-29 WO disclosed