SCHEMBL566552

SCHEMBL566552

F[C](Br)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2118974 0.76
SCHEMBL27180498 0.70
SCHEMBL1995795 0.70
SCHEMBL1221569 0.70
SCHEMBL2471421 0.70
SCHEMBL1221573 0.70
SCHEMBL1900947 0.70
SCHEMBL10394668 0.70
SCHEMBL9859139 0.70
SCHEMBL406386 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109456435-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN claimed
CN-109438695-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN claimed
CN-109456435-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN disclosed
CN-109456435-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN disclosed
CN-109438695-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN disclosed
CN-109438695-B Synthetic method of perfluorocyclobutyl polyarylether containing heteronaphthalene biphenyl structure 大连理工大学 2021-05-11 CN disclosed
EP-3180324-B1 HYPERVALENT IODINE CF2CF2X REAGENTS AND THEIR USE ETH ZUERICH (CH) 2020-11-25 EP disclosed
US-10669250-B2 Hypervalent iodine CF2CF2X reagents and their use ETH ZURICH (CH) 2020-06-02 US disclosed
US-20190040036-A1 HYPERVALENT IODINE CF2CF2X REAGENTS AND THEIR USE ETH ZURICH (CH) 2019-02-07 US disclosed
US-10040812-B2 Hypervalent iodine CF2CF2X reagents and their use ETH ZURICH (CH) 2018-08-07 US disclosed
US-20170233420-A1 HYPERVALENT IODINE CF2CF2X REAGENTS AND THEIR USE ETH ZURICH (CH) 2017-08-17 US disclosed
US-6875819-B2 Fluorinated cycloolefin polymers, processes for preparation of fluorinated cycloofefin monomers and polymers thereof, and use of the same MITSUI CHEMICALS, INC. (JP) 2005-04-05 US disclosed
US-20030187168-A1 Fluorinated cycloolefin polymers, processes for preparation of fluorinated cycloofefin monomers and polymers thereof, and use of the same MITSUI CHEMICALS, INC. (JP) 2003-10-02 US disclosed
EP-1348716-A1 Aromatic polymer, method for producing the same and uses thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-10-01 EP disclosed
US-20030180596-A1 Aromatic polymer, method for producing the same and uses thereof SUMITOMO CHEMICAL COMPANY, LIMITED 2003-09-25 US disclosed
EP-1298156-A1 FLUORINATED CYCLOOLEFIN POLYMERS, PROCESSES FOR PREPARATION OF FLUORINATED CYCLOOLEFIN MONOMERS AND POLYMERS THEREOF, AND USE OF THE SAME Mitsui Chemicals, Inc. (JP) 2003-04-02 EP disclosed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed