Allyl Alcohol

Allyl Alcohol

SCHEMBL5668268

C=CCO.S

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Allyl Alcohol SCHEMBL4654133 1.00 — —
Allyl Alcohol SCHEMBL4940557 0.95 — —
Allyl Alcohol SCHEMBL3782 0.95 — —
Allyl Alcohol SCHEMBL1331425 0.95 — —
Allyl Alcohol SCHEMBL1332489 0.95 — —
Allyl Alcohol SCHEMBL252427 0.90 — —
Allyl Alcohol SCHEMBL1739867 0.90 — —
Allyl Alcohol SCHEMBL7157023 0.90 — —
Allyl Alcohol SCHEMBL620008 0.90 — —
Allyl Alcohol SCHEMBL793216 0.90 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5026915-A Catalytially reacting alkyl alcohol with hydrogen sulfide to produce alkyl mercaptan, reacting intermediate with molten sulfur to produce alkyl disulfide ATOCHEM NORTH AMERICA, INC. (US) 1991-06-25 — — US claimed
CN-116171342-B Decomposition control method of corrosion-resistant paper 日本甜菜制糖株式会社 2024-04-30 — — CN disclosed
CN-116171342-A Decomposition control method of corrosion-resistant paper 日本甜菜制糖株式会社 2023-05-26 — — CN disclosed
CN-106455565-A Use of substituted oxotetrahydroquinoline sulfonamides or salts thereof for increasing stress tolerance in plants 拜耳作物科学股份公司 2017-02-22 — — CN disclosed
CN-102844710-A Pattern forming method and resist composition FUJIFILM CORP 2012-12-26 — — CN disclosed
CN-102822746-A Pattern forming method and resist composition FUJIFILM CORP 2012-12-12 — — CN disclosed
CN-102812400-A Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same FUJIFILM CORP 2012-12-05 — — CN disclosed
CN-102792229-A Pattern forming method FUJIFILM CORP 2012-11-21 — — CN disclosed
CN-102666541-A Purine or deazapurine derivatives for the treatment of, in particular, viral infections GILEAD SCIENCES INC 2012-09-12 — — CN disclosed
CN-101855361-A Enzymatic methods and enzymes GIVAUDAN SA 2010-10-06 — — CN disclosed
US-6982188-B1 Post CMP precursor treatment ADVANCED MICRO DEVICES, INC (US) 2006-01-03 — — US disclosed
US-6936545-B1 Organic memory cell formation on Ag substrate ADVANCED MICRO DEVICES, INC. (US) 2005-08-30 — — US disclosed
US-6422918-B1 Chemical-mechanical polishing of photoresist layer ADVANCED MICRO DEVICES, INC. 2002-07-23 — — US disclosed
CN-1046723-C Tetracyclic compounds as dopamine agonists ABBOTT LAB (US) 1999-11-24 — — CN disclosed
CN-1124489-A Tetracyclic compounds as dopamine agonists ABBOTT LAB (US) 1996-06-12 — — CN disclosed
EP-0422179-A1 FABRIC CONDITIONERS. BP CHEM INT LTD (GB) 1991-04-17 — — EP disclosed
US-4097502-A HYDROPHOBIC-HYDROPHILIC BALANCE LIPID SPECIALTIES, INC., A CORP. OF MA 1978-06-27 — — US disclosed
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