⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6547798 | 0.69 | — | — | |
| SCHEMBL5439184 | 0.67 | — | — | |
| SCHEMBL151443 | 0.64 | — | — | |
| SCHEMBL7053456 | 0.61 | — | — | |
| SCHEMBL2997655 | 0.61 | — | — | |
| SCHEMBL6204584 | 0.61 | — | — | |
| SCHEMBL11331337 | 0.61 | — | — | |
| SCHEMBL4529855 | 0.61 | — | — | |
| SCHEMBL11241015 | 0.61 | — | — | |
| SCHEMBL514447 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1406122-B1 | PHOTOSENSITIVE COMPOSITION AND ACID GENERATOR | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | disclosed |
| US-7033727-B2 | Photosensitive composition and acid generator | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-7022459-B2 | Relation between the content of the acid generator, the resin that is decomposed by the acid to increase solubility in an alkali developing solution, the performance adjusting agent , and the solvent satisfies a given equation; good profile and has small dependency on post-exposure baking (PEB) | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-20040185373-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-09-23 | — | — | US | disclosed |
| US-20040072097-A1 | Photosensitive composition and acid generator | FUJI PHOTO FILM CO., LTD. | 2004-04-15 | — | — | US | disclosed |
| EP-1406122-A2 | Photosensitive composition and acid generator | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-07 | — | — | EP | disclosed |