SCHEMBL5675684

SCHEMBL5675684

CCc1cc(C(CC2CO2)(CC2CO2)c2c(CC3CO3)cc(N)c(CC)c2CC2CO2)ccc1N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8847400 0.81
SCHEMBL18318702 0.78
SCHEMBL5675680 0.71
SCHEMBL16752059 0.69 ESR1 (0.35)
SCHEMBL18319153 0.68 ESR1 (0.35)
SCHEMBL18318334 0.68 ESR1 (0.34)
SCHEMBL16752007 0.68 ESR1 (0.38)
SCHEMBL10356211 0.66 MAPT (0.35)
SCHEMBL16752000 0.66 ESR1 (0.36)
SCHEMBL16752015 0.66 ESR1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1297048-B1 LOW MOISTURE ABSORPTION EPOXY RESIN SYSTEMS CYTEC TECH CORP (US) 2006-01-11 EP disclosed
US-6379799-B1 CURABLE EPOXIDE REACTION PRODUCT OF PHENOL, DICYCLOPENTADIENE AND EPICHLOROHYDRIN; HEAT RESISTANCE, WATERPROOFING; AEROSPACE CYTEC TECHNOLOGY CORP. 2002-04-30 US disclosed