SCHEMBL5684180

SCHEMBL5684180

[CH2]CCCCCC(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5685126 1.00
SCHEMBL7859428 1.00
SCHEMBL7754240 1.00
SCHEMBL7754194 1.00
SCHEMBL2433611 0.97
SCHEMBL248386 0.87
SCHEMBL3086208 0.83 MAPT (0.32)
SCHEMBL13719307 0.79
SCHEMBL13719304 0.79
SCHEMBL9591228 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2684870-A1 METHOD FOR PREPARING THIOCARBOXYLIC ACID S-(FLUOROALKYL) ESTER Sumitomo Chemical Company Limited (JP) 2014-01-15 EP disclosed
CN-102471252-A Process for producing (fluoroalkylthio) acetic acid ester SUMITOMO CHEMICAL CO 2012-05-23 CN disclosed
CN-100422124-C Fused ring compound DAINIPPON INK & CHEMICALS (JP) 2008-10-01 CN disclosed
US-7067179-B1 Fused ring compound DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-06-27 US disclosed
EP-1201632-B1 FUSED RING COMPOUND DAINIPPON INK & CHEMICALS (JP) 2006-03-29 EP disclosed
CN-1223561-C Compound having tetrahydronalphthalene skeleton and liquid crystal compsn. contg. same DAINIPPON INK & CHEMICALS (JP) 2005-10-19 CN disclosed
EP-1191008-B1 COMPOUND HAVING TETRAHYDRONAPHTHALENE SKELETON AND LIQUID CRYSTAL COMPOSITION CONTAINING THE SAME DAINIPPON INK & CHEMICALS (JP) 2005-02-09 EP disclosed
US-6746728-B1 SUPERIOR LIQUID CRYSTALLINITY AND CO-SOLUBILITY WITH CURRENTLY USED LIQUID CRYSTAL COMPOUNDS; TEMPERATURE RANGE OVER WHICH LIQUID CRYSTALLINITY IS SHOWN IS BROAD; THRESHOLD VOLTAGE IS LOW; CAPABLE OF HIGH SPEED RESPONSE DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-06-08 US disclosed
CN-1356969-A Compound having tetrahydronalphthalene skeleton and liquid crystal compsn. contg. same DAINIPPON INK & CHEMICALS (JP) 2002-07-03 CN disclosed
EP-1201632-A1 FUSED RING COMPOUND DAINIPPON INK AND CHEMICALS, INC. (JP) 2002-05-02 EP disclosed
EP-0670322-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-09-06 EP disclosed
EP-0668284-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-08-23 EP disclosed
EP-0668286-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-08-23 EP disclosed
EP-0668285-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-08-23 EP disclosed
EP-0665232-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-08-02 EP disclosed
EP-0659753-A1 A silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-06-28 EP disclosed
EP-0657460-A1 A silacyclohexane compound, a method of prepraring it and a liquid crystal composition containing it SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-06-14 EP disclosed
EP-0650969-A1 A Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it Shin-Etsu Chemical Co., Ltd. (JP) 1995-05-03 EP disclosed
EP-0609253-A1 PROCESS FOR PREPARING A MIXTURE OF DODECADIENOL ISOMERS, INTERMEDIATES FOR PREPARING THE SAME AND ITS USE. BASF AG (DE) 1994-08-10 EP disclosed
WO-1993008148-A1 PROCESS FOR PREPARING A MIXTURE OF DODECADIENOL ISOMERS, INTERMEDIATES FOR PREPARING THE SAME AND ITS USE BASF AKTIENGESELLSCHAFT (DE) 1993-04-29 WO disclosed