SCHEMBL5686223

SCHEMBL5686223

C=C[SiH2]NC(=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9358718 0.76 GAA (0.37)
SCHEMBL27985614 0.73
SCHEMBL7543688 0.73
SCHEMBL28110736 0.73
SCHEMBL35709 0.71
SCHEMBL4553719 0.71
Water SCHEMBL8015202 0.70
SCHEMBL361310 0.69
SCHEMBL638200 0.68
SCHEMBL93928 0.68 GAA (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1117726-B1 COSMETIC PRODUCTS BASED ON URETHANE(METH)ACRYLATES CONTAINING SILOXANE GROUPS AND THEIR FREE RADICAL POLYMERISATION PRODUCTS BASF AG (DE) 2006-05-03 EP disclosed
EP-1117726-A1 URETHANE(METH)ACRYLATES CONTAINING SILOXANE GROUPS AND ABLE TO UNDERGO FREE-RADICAL POLYMERISATION BASF AKTIENGESELLSCHAFT (DE) 2001-07-25 EP disclosed
WO-2000012588-A1 URETHANE(METH)ACRYLATES CONTAINING SILOXANE GROUPS AND ABLE TO UNDERGO FREE-RADICAL POLYMERISATION BASF AKTIENGESELLSCHAFT (DE) 2000-03-09 WO disclosed